INIS
doped materials
100%
fabrication
100%
spacers
100%
cobalt silicides
100%
mosfet
100%
nitrides
60%
implants
40%
comparative evaluations
20%
silicon
20%
oxides
20%
barriers
20%
energy sources
20%
masking
20%
silicon nitrides
20%
Keyphrases
Self-aligned
100%
Cobalt Silicide
100%
Lightly Doped Drain
100%
MOSFET Fabrication
100%
Nitrides
75%
Oxides
25%
Amorphous Silicon
25%
Metallization
25%
Silicon Nitride
25%
Gate Edge
25%
Low-grade Energy
25%
Silicidation
25%
α-Si
25%
MOSFET
25%
Material Science
Cobalt
100%
Silicide
100%
Metal-Oxide-Semiconductor Field-Effect Transistor
100%
Nitride Compound
100%
Silicon Nitride
33%
Field Effect Transistors
33%
Amorphous Silicon
33%
Oxide Compound
33%
Chemical Engineering
Silicide
100%
Nitride
100%
Metallizing
33%
Silicon Nitride
33%