Abstract
A strong need exists for effective nanopatterning
technique to fabricate the next generation devices at low
cost and high volumes. Nanoimprint lithography (NIL) has
received a lot of attention, because of its process
simplicity. Roll to Roll nanoimprint (R2RNIL) can be used
for optics and electronics, such as wire grid
polarizers and transparent conductive sheet. In this
study, we have examined R2RNIL high speed patterning of
nanogratings on a plastic film. Our mold design consists
of nanoscale line and space (LS) pattern. In order to
fabricate the nanoscale pattern by using R2RNIL it is
very important to understand replication behavior at the
nanometer scale to predict the fabricated pattern. We
focus on the replication behavior for a cellulose acetate
film via thermal R2RNIL. A flexible nickel replica mold
was attached to the upper roll, which was be
heated to target temperature. We have used the master
nanogratings mold with line and space width of a 580 nm
and 2160 nm, respectively. The pressure applied from the
lower roll by air cylinder was 6.5 MPa. The temperature
of the upper roll was varied from 31 to 120 °C when line
feeding speed was constant (0.4-0.5
m/min). The Tg of cellulose acetate film (90 ??m
thickness) is 120 °C. The heights of the mold and the
transferred pattern on the film were measured using
atomic force microscopy (AFM, Digital Instrument Co.,
Dimension 3000)
Original language | English |
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Title of host publication | 58th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication, EIPBN 2014 |
Publication status | Published - 2014 |
MoE publication type | A4 Article in a conference publication |
Event | 58th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication, EIPBN 2014 - Washington DC, United States Duration: 27 May 2014 → 30 May 2014 |
Conference
Conference | 58th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication, EIPBN 2014 |
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Abbreviated title | EIPBN 2014 |
Country/Territory | United States |
City | Washington DC |
Period | 27/05/14 → 30/05/14 |
Keywords
- roll-to-roll
- nanoimprint lithography