Thermal roll to roll nanoimprint using replica mould made by UV curable resin

Shohei Kakimoto, Noriyuki Unno, Tapio Mäkelä, Shin Hiwasa, Jun Taniguchi

Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientific

Abstract

Thermal nanoimprint lithography (T-NIL), in which thermoplastics are used as transfer substrates, is expected to be a nextgeneration technique for the high-throughput fabrication of nanopatterns. Thermoplastics are less expensive than the UV-curable resins that are used for UV violet nanoimprinting. Furthermore, a wide variety of thermoplastics are available with desirable properties such as transparency, chemical durability, or high hardness. In the T-NIL process, master moulds made of silicon or quartz substrates are normally used because of their high resolution. However, cost of fabricating such master moulds is high because of the complexity of the fabrication processes. Furthermore, silicon and quartz are not flexible, so it is difficult to perform thermal roll-to-roll nanoimprinting (T-R2RNIL) by using a master mould. We performed T-R2RNIL by using a flexible replica mould made of a special UV-curable resin, instead of a flexible nickel mould, typically used for T-R2RNIL. We succeeded in fabricating a submicron line-and-space pattern by using the replica mould in T-R2RNIL without any release agent. We believe that our technique will be helpful in reducing the cost of moulds for T-R2RNIL.
Original languageEnglish
Title of host publicationMNE2015
Publication statusPublished - 2015
MoE publication typeB3 Non-refereed article in conference proceedings
Event41st Micro and Nano engineering, MNE2015 - The Hague, Netherlands
Duration: 21 Sep 201524 Sep 2015
Conference number: 41

Conference

Conference41st Micro and Nano engineering, MNE2015
Abbreviated titleMNE2015
CountryNetherlands
CityThe Hague
Period21/09/1524/09/15

Fingerprint

Thermoplastics
Nanoimprint lithography
Resins
Quartz
Fabrication
Silicon
Substrates
Transparency
Costs
Durability
Hardness
Nickel
Throughput
Hot Temperature

Keywords

  • nanoimprinting
  • thermal roll-to-roll nanoimprint
  • replica mould
  • UV-curable resin
  • release agent-free

Cite this

Kakimoto, S., Unno, N., Mäkelä, T., Hiwasa, S., & Taniguchi, J. (2015). Thermal roll to roll nanoimprint using replica mould made by UV curable resin. In MNE2015
Kakimoto, Shohei ; Unno, Noriyuki ; Mäkelä, Tapio ; Hiwasa, Shin ; Taniguchi, Jun. / Thermal roll to roll nanoimprint using replica mould made by UV curable resin. MNE2015. 2015.
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abstract = "Thermal nanoimprint lithography (T-NIL), in which thermoplastics are used as transfer substrates, is expected to be a nextgeneration technique for the high-throughput fabrication of nanopatterns. Thermoplastics are less expensive than the UV-curable resins that are used for UV violet nanoimprinting. Furthermore, a wide variety of thermoplastics are available with desirable properties such as transparency, chemical durability, or high hardness. In the T-NIL process, master moulds made of silicon or quartz substrates are normally used because of their high resolution. However, cost of fabricating such master moulds is high because of the complexity of the fabrication processes. Furthermore, silicon and quartz are not flexible, so it is difficult to perform thermal roll-to-roll nanoimprinting (T-R2RNIL) by using a master mould. We performed T-R2RNIL by using a flexible replica mould made of a special UV-curable resin, instead of a flexible nickel mould, typically used for T-R2RNIL. We succeeded in fabricating a submicron line-and-space pattern by using the replica mould in T-R2RNIL without any release agent. We believe that our technique will be helpful in reducing the cost of moulds for T-R2RNIL.",
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Kakimoto, S, Unno, N, Mäkelä, T, Hiwasa, S & Taniguchi, J 2015, Thermal roll to roll nanoimprint using replica mould made by UV curable resin. in MNE2015. 41st Micro and Nano engineering, MNE2015, The Hague, Netherlands, 21/09/15.

Thermal roll to roll nanoimprint using replica mould made by UV curable resin. / Kakimoto, Shohei; Unno, Noriyuki; Mäkelä, Tapio; Hiwasa, Shin; Taniguchi, Jun.

MNE2015. 2015.

Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientific

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T1 - Thermal roll to roll nanoimprint using replica mould made by UV curable resin

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AU - Unno, Noriyuki

AU - Mäkelä, Tapio

AU - Hiwasa, Shin

AU - Taniguchi, Jun

PY - 2015

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N2 - Thermal nanoimprint lithography (T-NIL), in which thermoplastics are used as transfer substrates, is expected to be a nextgeneration technique for the high-throughput fabrication of nanopatterns. Thermoplastics are less expensive than the UV-curable resins that are used for UV violet nanoimprinting. Furthermore, a wide variety of thermoplastics are available with desirable properties such as transparency, chemical durability, or high hardness. In the T-NIL process, master moulds made of silicon or quartz substrates are normally used because of their high resolution. However, cost of fabricating such master moulds is high because of the complexity of the fabrication processes. Furthermore, silicon and quartz are not flexible, so it is difficult to perform thermal roll-to-roll nanoimprinting (T-R2RNIL) by using a master mould. We performed T-R2RNIL by using a flexible replica mould made of a special UV-curable resin, instead of a flexible nickel mould, typically used for T-R2RNIL. We succeeded in fabricating a submicron line-and-space pattern by using the replica mould in T-R2RNIL without any release agent. We believe that our technique will be helpful in reducing the cost of moulds for T-R2RNIL.

AB - Thermal nanoimprint lithography (T-NIL), in which thermoplastics are used as transfer substrates, is expected to be a nextgeneration technique for the high-throughput fabrication of nanopatterns. Thermoplastics are less expensive than the UV-curable resins that are used for UV violet nanoimprinting. Furthermore, a wide variety of thermoplastics are available with desirable properties such as transparency, chemical durability, or high hardness. In the T-NIL process, master moulds made of silicon or quartz substrates are normally used because of their high resolution. However, cost of fabricating such master moulds is high because of the complexity of the fabrication processes. Furthermore, silicon and quartz are not flexible, so it is difficult to perform thermal roll-to-roll nanoimprinting (T-R2RNIL) by using a master mould. We performed T-R2RNIL by using a flexible replica mould made of a special UV-curable resin, instead of a flexible nickel mould, typically used for T-R2RNIL. We succeeded in fabricating a submicron line-and-space pattern by using the replica mould in T-R2RNIL without any release agent. We believe that our technique will be helpful in reducing the cost of moulds for T-R2RNIL.

KW - nanoimprinting

KW - thermal roll-to-roll nanoimprint

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KW - UV-curable resin

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M3 - Conference article in proceedings

BT - MNE2015

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Kakimoto S, Unno N, Mäkelä T, Hiwasa S, Taniguchi J. Thermal roll to roll nanoimprint using replica mould made by UV curable resin. In MNE2015. 2015