Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition

Engineering

• Atomic Layer Deposition 100%
• Thermal Processing 40%
• Thin Films 30%
• Plasma Process 30%
• Growth Temperature 20%
• Expansion Coefficient 20%
• Temperature 20%
• Deposition Temperature 10%
• Operation Temperature 10%
• Crystallinity 10%
• Major Change 10%
• Applications 10%
• Performance 10%
• Failure (Mechanical) 10%
• Lower Temperature 10%
• Substrates 10%
• Thermal Annealing 10%
• Aluminum Oxide 10%

Physics

• Atomic Layer Epitaxy 100%
• Thin Films 30%
• Thermal Expansion 20%
• Optical Properties 20%
• Temperature 20%
• Nitrogen 10%
• Microelectromechanical System 10%
• Crystallinity 10%
• Utilization 10%
• Increasing 10%
• Value 10%
• Performance 10%
• Oxygen 10%
• Substrates 10%
• Failure 10%

Material Science

• Residual Stress 90%
• Al2O3 60%
• Devices 40%
• Thin Films 30%
• Liquid Films 30%
• Thermal Expansion 20%
• Thermal Cycling 10%
• Thermomechanical Property 10%