Thin (25 nm) and highly uniform Al2O3 coatings have been deposited at relatively low temperature of 80 and 100 °C onto various bio-based polymeric materials employing the atomic layer deposition (ALD) technique. The work demonstrates that the ALD-grown Al2O3 coating significantly enhances the oxygen and water vapor barrier performance of these materials. Promising barrier properties were revealed for polylactide-coated board, hemicellulose-coated board as well as various biopolymer (polylactide, pectin and nano-fibrillated cellulose) films.
- Atomic layer deposition
- packaging material
- aluminum oxide
Hirvikorpi, T., Vähä-Nissi, M., Nikkola, J., Harlin, A., & Karppinen, M. (2011). Thin Al2O3 barrier coatings onto temperature-sensitive packaging materials by atomic layer deposition. Surface and Coatings Technology, 205(21-22), 5088-5092. https://doi.org/10.1016/j.surfcoat.2011.05.017