Thin Al2O3 barrier coatings onto temperature-sensitive packaging materials by atomic layer deposition

Terhi Hirvikorpi, Mika Vähä-Nissi, Juha Nikkola, Ali Harlin, Maarit Karppinen

Research output: Contribution to journalArticleScientificpeer-review

75 Citations (Scopus)

Abstract

Thin (25 nm) and highly uniform Al2O3 coatings have been deposited at relatively low temperature of 80 and 100 °C onto various bio-based polymeric materials employing the atomic layer deposition (ALD) technique. The work demonstrates that the ALD-grown Al2O3 coating significantly enhances the oxygen and water vapor barrier performance of these materials. Promising barrier properties were revealed for polylactide-coated board, hemicellulose-coated board as well as various biopolymer (polylactide, pectin and nano-fibrillated cellulose) films.
Original languageEnglish
Pages (from-to)5088-5092
JournalSurface and Coatings Technology
Volume205
Issue number21-22
DOIs
Publication statusPublished - 2011
MoE publication typeA1 Journal article-refereed

Keywords

  • Atomic layer deposition
  • barrier
  • packaging material
  • recyclability
  • aluminum oxide
  • biopolymer

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