Thin Al2O3 barrier coatings onto temperature-sensitive packaging materials by atomic layer deposition

Terhi Hirvikorpi, Mika Vähä-Nissi, Juha Nikkola, Ali Harlin, Maarit Karppinen

Research output: Contribution to journal › Article › Scientific › peer-review

67 Citations (Scopus)

Abstract

Thin (25 nm) and highly uniform Al2O3 coatings have been deposited at relatively low temperature of 80 and 100 °C onto various bio-based polymeric materials employing the atomic layer deposition (ALD) technique. The work demonstrates that the ALD-grown Al2O3 coating significantly enhances the oxygen and water vapor barrier performance of these materials. Promising barrier properties were revealed for polylactide-coated board, hemicellulose-coated board as well as various biopolymer (polylactide, pectin and nano-fibrillated cellulose) films.
Original languageEnglish
Pages (from-to)5088-5092
JournalSurface and Coatings Technology
Volume205
Issue number21-22
DOIs
Publication statusPublished - 2011
MoE publication typeA1 Journal article-refereed

Fingerprint

Packaging materials
Atomic layer deposition
atomic layer epitaxy
packaging
Cellulose films
coatings
Coatings
Biopolymers
biopolymers
Steam
cellulose
Water vapor
water vapor
vapors
Oxygen
Temperature
temperature
oxygen
Polymers
poly(lactide)

Keywords

  • Atomic layer deposition
  • barrier
  • packaging material
  • recyclability
  • aluminum oxide
  • biopolymer

Cite this

Hirvikorpi, Terhi ; Vähä-Nissi, Mika ; Nikkola, Juha ; Harlin, Ali ; Karppinen, Maarit. / Thin Al2O3 barrier coatings onto temperature-sensitive packaging materials by atomic layer deposition. In: Surface and Coatings Technology. 2011 ; Vol. 205, No. 21-22. pp. 5088-5092.
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abstract = "Thin (25 nm) and highly uniform Al2O3 coatings have been deposited at relatively low temperature of 80 and 100 °C onto various bio-based polymeric materials employing the atomic layer deposition (ALD) technique. The work demonstrates that the ALD-grown Al2O3 coating significantly enhances the oxygen and water vapor barrier performance of these materials. Promising barrier properties were revealed for polylactide-coated board, hemicellulose-coated board as well as various biopolymer (polylactide, pectin and nano-fibrillated cellulose) films.",
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Hirvikorpi, T, Vähä-Nissi, M, Nikkola, J, Harlin, A & Karppinen, M 2011, 'Thin Al2O3 barrier coatings onto temperature-sensitive packaging materials by atomic layer deposition', Surface and Coatings Technology, vol. 205, no. 21-22, pp. 5088-5092. https://doi.org/10.1016/j.surfcoat.2011.05.017

Thin Al2O3 barrier coatings onto temperature-sensitive packaging materials by atomic layer deposition. / Hirvikorpi, Terhi; Vähä-Nissi, Mika; Nikkola, Juha; Harlin, Ali; Karppinen, Maarit.

In: Surface and Coatings Technology, Vol. 205, No. 21-22, 2011, p. 5088-5092.

Research output: Contribution to journal › Article › Scientific › peer-review

TY - JOUR

T1 - Thin Al2O3 barrier coatings onto temperature-sensitive packaging materials by atomic layer deposition

AU - Hirvikorpi, Terhi

AU - Vähä-Nissi, Mika

AU - Nikkola, Juha

AU - Harlin, Ali

AU - Karppinen, Maarit

N1 - Project code: 42240

PY - 2011

Y1 - 2011

N2 - Thin (25 nm) and highly uniform Al2O3 coatings have been deposited at relatively low temperature of 80 and 100 °C onto various bio-based polymeric materials employing the atomic layer deposition (ALD) technique. The work demonstrates that the ALD-grown Al2O3 coating significantly enhances the oxygen and water vapor barrier performance of these materials. Promising barrier properties were revealed for polylactide-coated board, hemicellulose-coated board as well as various biopolymer (polylactide, pectin and nano-fibrillated cellulose) films.

AB - Thin (25 nm) and highly uniform Al2O3 coatings have been deposited at relatively low temperature of 80 and 100 °C onto various bio-based polymeric materials employing the atomic layer deposition (ALD) technique. The work demonstrates that the ALD-grown Al2O3 coating significantly enhances the oxygen and water vapor barrier performance of these materials. Promising barrier properties were revealed for polylactide-coated board, hemicellulose-coated board as well as various biopolymer (polylactide, pectin and nano-fibrillated cellulose) films.

KW - Atomic layer deposition

KW - barrier

KW - packaging material

KW - recyclability

KW - aluminum oxide

KW - biopolymer

U2 - 10.1016/j.surfcoat.2011.05.017

DO - 10.1016/j.surfcoat.2011.05.017

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EP - 5092

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

SN - 0257-8972

IS - 21-22

ER -

Hirvikorpi T, Vähä-Nissi M, Nikkola J, Harlin A, Karppinen M. Thin Al2O3 barrier coatings onto temperature-sensitive packaging materials by atomic layer deposition. Surface and Coatings Technology. 2011;205(21-22):5088-5092. https://doi.org/10.1016/j.surfcoat.2011.05.017

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