Abstract
Thin (25 nm) and highly uniform Al2O3 coatings have been
deposited at relatively low temperature of 80 and 100 °C
onto various bio-based polymeric materials employing the
atomic layer deposition (ALD) technique. The work
demonstrates that the ALD-grown Al2O3 coating
significantly enhances the oxygen and water vapor barrier
performance of these materials. Promising barrier
properties were revealed for polylactide-coated board,
hemicellulose-coated board as well as various biopolymer
(polylactide, pectin and nano-fibrillated cellulose)
films.
| Original language | English |
|---|---|
| Pages (from-to) | 5088-5092 |
| Journal | Surface and Coatings Technology |
| Volume | 205 |
| Issue number | 21-22 |
| DOIs | |
| Publication status | Published - 2011 |
| MoE publication type | A1 Journal article-refereed |
Keywords
- Atomic layer deposition
- barrier
- packaging material
- recyclability
- aluminum oxide
- biopolymer
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Cite this
Hirvikorpi, T., Vähä-Nissi, M., Nikkola, J., Harlin, A., & Karppinen, M. (2011). Thin Al2O3 barrier coatings onto temperature-sensitive packaging materials by atomic layer deposition. Surface and Coatings Technology, 205(21-22), 5088-5092. https://doi.org/10.1016/j.surfcoat.2011.05.017