Thin (25 nm) and highly uniform Al2O3 coatings have been deposited at relatively low temperature of 80 and 100°C onto various bio-based polymeric materials employing the atomic layer deposition (ALD) technique. The work demonstrates that the ALD-grown Al2O3 coating significantly enhances the oxygen and water vapor barrier performance of these materials. Promising barrier properties were revealed for polylactide-coated board, hemicellulose-coated board as well as various biopolymer (polylactide, pectin and nano-fibrillated cellulose) films.
|Journal||Surface and Coatings Technology|
|Publication status||Published - 2011|
|MoE publication type||A1 Journal article-refereed|
- Atomic layer deposition
- packaging material
- aluminum oxide