Thin film absorbers for visible, near-infrared, and short-wavelength infrared spectra

Mari Laamanen (Corresponding Author), Martti Blomberg, Riikka Puurunen, Akseli Miranto, Hannu Kattelus

Research output: Contribution to journalArticleScientificpeer-review

6 Citations (Scopus)

Abstract

Two thin film absorbers are presented in this paper: one for the visible (VIS) and the near-infrared (NIR) spectra in the wavelength range of 350…1000 nm, the other for the short-wavelength infrared (SWIR) spectrum in the wavelength range of 1200…2000 nm. First, the refractive indices were determined for Al2O3 films prepared with atomic layer deposition (ALD), and amorphous Mo–Si–N films prepared with reactive sputter deposition. The measurements were made by spectroscopic reflectometry, ellipsometry, gonioreflectometry, and double-beam transfer standard spectrometry. The results were utilised in the design of the absorbers. The absorbers were manufactured as well, and they proved to have high absorption over their whole working spectra varying from 93.4% at the minimum to 99.9% at the maximum. The absorbers are applicable, e.g. to MEMS thermopile detectors.
Original languageEnglish
Pages (from-to)210-214
Number of pages5
JournalSensors and Actuators A: Physical
Volume162
Issue number2
DOIs
Publication statusPublished - 2010
MoE publication typeA1 Journal article-refereed
Event23rd Conference EUROSENSORS 2009 - Lausanne, Switzerland
Duration: 6 Sep 20099 Sep 2009

Fingerprint

absorbers
infrared spectra
Infrared radiation
Thin films
Wavelength
thin films
wavelengths
Thermopiles
Sputter deposition
Spectroscopic ellipsometry
Atomic layer deposition
Amorphous films
thermopiles
Spectrometry
MEMS
Refractive index
atomic layer epitaxy
ellipsometry
microelectromechanical systems
Detectors

Keywords

  • Absorber
  • Infrared
  • MEMS
  • Mo-Si-N
  • Refractive index
  • Visible light

Cite this

Laamanen, Mari ; Blomberg, Martti ; Puurunen, Riikka ; Miranto, Akseli ; Kattelus, Hannu. / Thin film absorbers for visible, near-infrared, and short-wavelength infrared spectra. In: Sensors and Actuators A: Physical. 2010 ; Vol. 162, No. 2. pp. 210-214.
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abstract = "Two thin film absorbers are presented in this paper: one for the visible (VIS) and the near-infrared (NIR) spectra in the wavelength range of 350…1000 nm, the other for the short-wavelength infrared (SWIR) spectrum in the wavelength range of 1200…2000 nm. First, the refractive indices were determined for Al2O3 films prepared with atomic layer deposition (ALD), and amorphous Mo–Si–N films prepared with reactive sputter deposition. The measurements were made by spectroscopic reflectometry, ellipsometry, gonioreflectometry, and double-beam transfer standard spectrometry. The results were utilised in the design of the absorbers. The absorbers were manufactured as well, and they proved to have high absorption over their whole working spectra varying from 93.4{\%} at the minimum to 99.9{\%} at the maximum. The absorbers are applicable, e.g. to MEMS thermopile detectors.",
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Thin film absorbers for visible, near-infrared, and short-wavelength infrared spectra. / Laamanen, Mari (Corresponding Author); Blomberg, Martti; Puurunen, Riikka; Miranto, Akseli; Kattelus, Hannu.

In: Sensors and Actuators A: Physical, Vol. 162, No. 2, 2010, p. 210-214.

Research output: Contribution to journalArticleScientificpeer-review

TY - JOUR

T1 - Thin film absorbers for visible, near-infrared, and short-wavelength infrared spectra

AU - Laamanen, Mari

AU - Blomberg, Martti

AU - Puurunen, Riikka

AU - Miranto, Akseli

AU - Kattelus, Hannu

PY - 2010

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N2 - Two thin film absorbers are presented in this paper: one for the visible (VIS) and the near-infrared (NIR) spectra in the wavelength range of 350…1000 nm, the other for the short-wavelength infrared (SWIR) spectrum in the wavelength range of 1200…2000 nm. First, the refractive indices were determined for Al2O3 films prepared with atomic layer deposition (ALD), and amorphous Mo–Si–N films prepared with reactive sputter deposition. The measurements were made by spectroscopic reflectometry, ellipsometry, gonioreflectometry, and double-beam transfer standard spectrometry. The results were utilised in the design of the absorbers. The absorbers were manufactured as well, and they proved to have high absorption over their whole working spectra varying from 93.4% at the minimum to 99.9% at the maximum. The absorbers are applicable, e.g. to MEMS thermopile detectors.

AB - Two thin film absorbers are presented in this paper: one for the visible (VIS) and the near-infrared (NIR) spectra in the wavelength range of 350…1000 nm, the other for the short-wavelength infrared (SWIR) spectrum in the wavelength range of 1200…2000 nm. First, the refractive indices were determined for Al2O3 films prepared with atomic layer deposition (ALD), and amorphous Mo–Si–N films prepared with reactive sputter deposition. The measurements were made by spectroscopic reflectometry, ellipsometry, gonioreflectometry, and double-beam transfer standard spectrometry. The results were utilised in the design of the absorbers. The absorbers were manufactured as well, and they proved to have high absorption over their whole working spectra varying from 93.4% at the minimum to 99.9% at the maximum. The absorbers are applicable, e.g. to MEMS thermopile detectors.

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KW - Infrared

KW - MEMS

KW - Mo-Si-N

KW - Refractive index

KW - Visible light

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JO - Sensors and Actuators A: Physical

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