Thin film conformality analysis with microscopic all-silicon lateral high aspect ratio structures

Riikka Puurunen, Oili Ylivaara, Markku Ylilammi

    Research output: Contribution to conferenceConference AbstractScientific

    Original languageEnglish
    Publication statusPublished - 2017
    EventJoint EuroCVD 21 - Baltic ALD 15 Conference - Linköping, Sweden
    Duration: 11 Jun 201714 Jun 2017

    Conference

    ConferenceJoint EuroCVD 21 - Baltic ALD 15 Conference
    CountrySweden
    CityLinköping
    Period11/06/1714/06/17

    Keywords

    • ALD
    • atomic layer deposition
    • conformality analysis
    • LHAR
    • lateral high aspect ratio structures

    Cite this

    Puurunen, R., Ylivaara, O., & Ylilammi, M. (2017). Thin film conformality analysis with microscopic all-silicon lateral high aspect ratio structures. Abstract from Joint EuroCVD 21 - Baltic ALD 15 Conference, Linköping, Sweden.