Thin film conformality analysis with microscopic all-silicon lateral high aspect ratio structures

Riikka Puurunen, Oili Ylivaara, Markku Ylilammi

Research output: Contribution to conference › Conference Abstract › Scientific

Original languageEnglish
Publication statusPublished - 2017
EventJoint EuroCVD 21 - Baltic ALD 15 Conference - Linköping, Sweden
Duration: 11 Jun 2017 → 14 Jun 2017

Conference

ConferenceJoint EuroCVD 21 - Baltic ALD 15 Conference
CountrySweden
CityLinköping
Period11/06/17 → 14/06/17

Keywords

  • ALD
  • atomic layer deposition
  • conformality analysis
  • LHAR
  • lateral high aspect ratio structures

Cite this

Puurunen, R., Ylivaara, O., & Ylilammi, M. (2017). Thin film conformality analysis with microscopic all-silicon lateral high aspect ratio structures. Abstract from Joint EuroCVD 21 - Baltic ALD 15 Conference, Linköping, Sweden.
Puurunen, Riikka ; Ylivaara, Oili ; Ylilammi, Markku. / Thin film conformality analysis with microscopic all-silicon lateral high aspect ratio structures. Abstract from Joint EuroCVD 21 - Baltic ALD 15 Conference, Linköping, Sweden.
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title = "Thin film conformality analysis with microscopic all-silicon lateral high aspect ratio structures",
keywords = "ALD, atomic layer deposition, conformality analysis, LHAR, lateral high aspect ratio structures",
author = "Riikka Puurunen and Oili Ylivaara and Markku Ylilammi",
note = "Project code: 102086 ; Joint EuroCVD 21 - Baltic ALD 15 Conference ; Conference date: 11-06-2017 Through 14-06-2017",
year = "2017",
language = "English",

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Puurunen, R, Ylivaara, O & Ylilammi, M 2017, 'Thin film conformality analysis with microscopic all-silicon lateral high aspect ratio structures' Joint EuroCVD 21 - Baltic ALD 15 Conference, Linköping, Sweden, 11/06/17 - 14/06/17, .

Thin film conformality analysis with microscopic all-silicon lateral high aspect ratio structures. / Puurunen, Riikka; Ylivaara, Oili; Ylilammi, Markku.

2017. Abstract from Joint EuroCVD 21 - Baltic ALD 15 Conference, Linköping, Sweden.

Research output: Contribution to conference › Conference Abstract › Scientific

TY - CONF

T1 - Thin film conformality analysis with microscopic all-silicon lateral high aspect ratio structures

AU - Puurunen, Riikka

AU - Ylivaara, Oili

AU - Ylilammi, Markku

N1 - Project code: 102086

PY - 2017

Y1 - 2017

KW - ALD

KW - atomic layer deposition

KW - conformality analysis

KW - LHAR

KW - lateral high aspect ratio structures

M3 - Conference Abstract

ER -

Puurunen R, Ylivaara O, Ylilammi M. Thin film conformality analysis with microscopic all-silicon lateral high aspect ratio structures. 2017. Abstract from Joint EuroCVD 21 - Baltic ALD 15 Conference, Linköping, Sweden.