Thin film conformality analysis with microscopic all-silicon lateral high aspect ratio structures

Riikka Puurunen, Oili Ylivaara, Markku Ylilammi

Research output: Contribution to conference › Conference Abstract › Scientific

Original language	English
Publication status	Published - 2017
Event	Joint EuroCVD 21 - Baltic ALD 15 Conference - Linköping, Sweden Duration: 11 Jun 2017 → 14 Jun 2017

Conference	Joint EuroCVD 21 - Baltic ALD 15 Conference
Country	Sweden
City	Linköping
Period	11/06/17 → 14/06/17

Keywords

@conference{24fb6176f78c4ab9b94113559c8b3f59,

title = "Thin film conformality analysis with microscopic all-silicon lateral high aspect ratio structures",

keywords = "ALD, atomic layer deposition, conformality analysis, LHAR, lateral high aspect ratio structures",

author = "Riikka Puurunen and Oili Ylivaara and Markku Ylilammi",

note = "Project code: 102086 ; Joint EuroCVD 21 - Baltic ALD 15 Conference ; Conference date: 11-06-2017 Through 14-06-2017",

year = "2017",

language = "English",

}

TY - CONF

T1 - Thin film conformality analysis with microscopic all-silicon lateral high aspect ratio structures

AU - Puurunen, Riikka

AU - Ylivaara, Oili

AU - Ylilammi, Markku

N1 - Project code: 102086

PY - 2017

Y1 - 2017

KW - ALD

KW - atomic layer deposition

KW - conformality analysis

KW - LHAR

KW - lateral high aspect ratio structures

M3 - Conference Abstract

T2 - Joint EuroCVD 21 - Baltic ALD 15 Conference

Y2 - 11 June 2017 through 14 June 2017

ER -