Thin film conformality analysis with microscopic all-silicon lateral high aspect ratio structures

Riikka Puurunen, Oili Ylivaara, Markku Ylilammi

    Research output: Contribution to conferenceConference AbstractScientific

    Original languageEnglish
    Publication statusPublished - 2017
    EventJoint EuroCVD 21 - Baltic ALD 15 Conference - Linköping, Sweden
    Duration: 11 Jun 201714 Jun 2017

    Conference

    ConferenceJoint EuroCVD 21 - Baltic ALD 15 Conference
    CountrySweden
    CityLinköping
    Period11/06/1714/06/17

    Keywords

    • ALD
    • atomic layer deposition
    • conformality analysis
    • LHAR
    • lateral high aspect ratio structures

    Cite this

    Puurunen, R., Ylivaara, O., & Ylilammi, M. (2017). Thin film conformality analysis with microscopic all-silicon lateral high aspect ratio structures. Abstract from Joint EuroCVD 21 - Baltic ALD 15 Conference, Linköping, Sweden.
    Puurunen, Riikka ; Ylivaara, Oili ; Ylilammi, Markku. / Thin film conformality analysis with microscopic all-silicon lateral high aspect ratio structures. Abstract from Joint EuroCVD 21 - Baltic ALD 15 Conference, Linköping, Sweden.
    @conference{24fb6176f78c4ab9b94113559c8b3f59,
    title = "Thin film conformality analysis with microscopic all-silicon lateral high aspect ratio structures",
    keywords = "ALD, atomic layer deposition, conformality analysis, LHAR, lateral high aspect ratio structures",
    author = "Riikka Puurunen and Oili Ylivaara and Markku Ylilammi",
    note = "Project code: 102086 ; Joint EuroCVD 21 - Baltic ALD 15 Conference ; Conference date: 11-06-2017 Through 14-06-2017",
    year = "2017",
    language = "English",

    }

    Puurunen, R, Ylivaara, O & Ylilammi, M 2017, 'Thin film conformality analysis with microscopic all-silicon lateral high aspect ratio structures', Joint EuroCVD 21 - Baltic ALD 15 Conference, Linköping, Sweden, 11/06/17 - 14/06/17.

    Thin film conformality analysis with microscopic all-silicon lateral high aspect ratio structures. / Puurunen, Riikka; Ylivaara, Oili; Ylilammi, Markku.

    2017. Abstract from Joint EuroCVD 21 - Baltic ALD 15 Conference, Linköping, Sweden.

    Research output: Contribution to conferenceConference AbstractScientific

    TY - CONF

    T1 - Thin film conformality analysis with microscopic all-silicon lateral high aspect ratio structures

    AU - Puurunen, Riikka

    AU - Ylivaara, Oili

    AU - Ylilammi, Markku

    N1 - Project code: 102086

    PY - 2017

    Y1 - 2017

    KW - ALD

    KW - atomic layer deposition

    KW - conformality analysis

    KW - LHAR

    KW - lateral high aspect ratio structures

    M3 - Conference Abstract

    ER -

    Puurunen R, Ylivaara O, Ylilammi M. Thin film conformality analysis with microscopic all-silicon lateral high aspect ratio structures. 2017. Abstract from Joint EuroCVD 21 - Baltic ALD 15 Conference, Linköping, Sweden.