Thin film conformality analysis with microscopic all-silicon lateral high aspect ratio structures

    Research output: Contribution to conferenceConference AbstractScientificpeer-review

    Original languageEnglish
    Publication statusPublished - 2017
    Event17th International Conference on Atomic Layer Deposition, ALD 2017 - Denver, United States
    Duration: 15 Jul 201718 Jul 2017

    Conference

    Conference17th International Conference on Atomic Layer Deposition, ALD 2017
    Abbreviated titleALD 2017
    CountryUnited States
    CityDenver
    Period15/07/1718/07/17

    Keywords

    • ALD
    • atomic layer deposition
    • LHAR
    • lateral high aspect ratio structures
    • conformality analysis

    Cite this

    Puurunen, R., Ylivaara, O., Grigoras, K., & Ylilammi, M. (2017). Thin film conformality analysis with microscopic all-silicon lateral high aspect ratio structures. Abstract from 17th International Conference on Atomic Layer Deposition, ALD 2017, Denver, United States.