Thin film conformality analysis with microscopic all-silicon lateral high aspect ratio structures

Riikka Puurunen, Oili Ylivaara, Kestutis Grigoras, Markku Ylilammi

Research output: Contribution to conferenceConference AbstractScientificpeer-review

Original languageEnglish
Publication statusPublished - 2017
Event17th International Conference on Atomic Layer Deposition, ALD 2017 - Denver, United States
Duration: 15 Jul 201718 Jul 2017

Conference

Conference17th International Conference on Atomic Layer Deposition, ALD 2017
Abbreviated titleALD 2017
CountryUnited States
CityDenver
Period15/07/1718/07/17

Keywords

  • ALD
  • atomic layer deposition
  • LHAR
  • lateral high aspect ratio structures
  • conformality analysis

Cite this

Puurunen, R., Ylivaara, O., Grigoras, K., & Ylilammi, M. (2017). Thin film conformality analysis with microscopic all-silicon lateral high aspect ratio structures. Abstract from 17th International Conference on Atomic Layer Deposition, ALD 2017, Denver, United States.
Puurunen, Riikka ; Ylivaara, Oili ; Grigoras, Kestutis ; Ylilammi, Markku. / Thin film conformality analysis with microscopic all-silicon lateral high aspect ratio structures. Abstract from 17th International Conference on Atomic Layer Deposition, ALD 2017, Denver, United States.
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title = "Thin film conformality analysis with microscopic all-silicon lateral high aspect ratio structures",
keywords = "ALD, atomic layer deposition, LHAR, lateral high aspect ratio structures, conformality analysis",
author = "Riikka Puurunen and Oili Ylivaara and Kestutis Grigoras and Markku Ylilammi",
note = "Project code: 102086; 17th International Conference on Atomic Layer Deposition, ALD 2017, ALD 2017 ; Conference date: 15-07-2017 Through 18-07-2017",
year = "2017",
language = "English",

}

Puurunen, R, Ylivaara, O, Grigoras, K & Ylilammi, M 2017, 'Thin film conformality analysis with microscopic all-silicon lateral high aspect ratio structures' 17th International Conference on Atomic Layer Deposition, ALD 2017, Denver, United States, 15/07/17 - 18/07/17, .

Thin film conformality analysis with microscopic all-silicon lateral high aspect ratio structures. / Puurunen, Riikka; Ylivaara, Oili; Grigoras, Kestutis; Ylilammi, Markku.

2017. Abstract from 17th International Conference on Atomic Layer Deposition, ALD 2017, Denver, United States.

Research output: Contribution to conferenceConference AbstractScientificpeer-review

TY - CONF

T1 - Thin film conformality analysis with microscopic all-silicon lateral high aspect ratio structures

AU - Puurunen, Riikka

AU - Ylivaara, Oili

AU - Grigoras, Kestutis

AU - Ylilammi, Markku

N1 - Project code: 102086

PY - 2017

Y1 - 2017

KW - ALD

KW - atomic layer deposition

KW - LHAR

KW - lateral high aspect ratio structures

KW - conformality analysis

M3 - Conference Abstract

ER -

Puurunen R, Ylivaara O, Grigoras K, Ylilammi M. Thin film conformality analysis with microscopic all-silicon lateral high aspect ratio structures. 2017. Abstract from 17th International Conference on Atomic Layer Deposition, ALD 2017, Denver, United States.