Thin film conformality analysis with microscopic all-silicon lateral high aspect ratio structures

Riikka Puurunen; Oili Ylivaara; Kestutis Grigoras; Markku Ylilammi

Thin film conformality analysis with microscopic all-silicon lateral high aspect ratio structures

Riikka Puurunen, Oili Ylivaara, Kestutis Grigoras, Markku Ylilammi

Aalto University

Research output: Contribution to conference › Conference Abstract › Scientific › peer-review

Original language	English
Publication status	Published - 2017
Event	17th International Conference on Atomic Layer Deposition, ALD 2017 - Denver, United States Duration: 15 Jul 2017 → 18 Jul 2017

Conference

Conference	17th International Conference on Atomic Layer Deposition, ALD 2017
Abbreviated title	ALD 2017
Country/Territory	United States
City	Denver
Period	15/07/17 → 18/07/17

Keywords

ALD
atomic layer deposition
LHAR
lateral high aspect ratio structures
conformality analysis

Cite this

@conference{adf88abf1578420dabc69bd775ec3dea,

title = "Thin film conformality analysis with microscopic all-silicon lateral high aspect ratio structures",

keywords = "ALD, atomic layer deposition, LHAR, lateral high aspect ratio structures, conformality analysis",

author = "Riikka Puurunen and Oili Ylivaara and Kestutis Grigoras and Markku Ylilammi",

note = "Project code: 102086; 17th International Conference on Atomic Layer Deposition, ALD 2017, ALD 2017 ; Conference date: 15-07-2017 Through 18-07-2017",

year = "2017",

language = "English",

}

Thin film conformality analysis with microscopic all-silicon lateral high aspect ratio structures. / Puurunen, Riikka; Ylivaara, Oili ; Grigoras, Kestutis et al.
2017. Abstract from 17th International Conference on Atomic Layer Deposition, ALD 2017, Denver, Colorado, United States.

Research output: Contribution to conference › Conference Abstract › Scientific › peer-review

TY - CONF

T1 - Thin film conformality analysis with microscopic all-silicon lateral high aspect ratio structures

AU - Puurunen, Riikka

AU - Ylivaara, Oili

AU - Grigoras, Kestutis

AU - Ylilammi, Markku

N1 - Project code: 102086

PY - 2017

Y1 - 2017

KW - ALD

KW - atomic layer deposition

KW - LHAR

KW - lateral high aspect ratio structures

KW - conformality analysis

M3 - Conference Abstract

T2 - 17th International Conference on Atomic Layer Deposition, ALD 2017

Y2 - 15 July 2017 through 18 July 2017

ER -