Thin film conformality analysis with microscopic all-silicon lateral high aspect ratio structures

Riikka Puurunen, Oili Ylivaara, Kestutis Grigoras, Markku Ylilammi

    Research output: Contribution to conferenceConference AbstractScientificpeer-review

    Original languageEnglish
    Publication statusPublished - 2017
    Event17th International Conference on Atomic Layer Deposition, ALD 2017 - Denver, United States
    Duration: 15 Jul 201718 Jul 2017

    Conference

    Conference17th International Conference on Atomic Layer Deposition, ALD 2017
    Abbreviated titleALD 2017
    CountryUnited States
    CityDenver
    Period15/07/1718/07/17

    Keywords

    • ALD
    • atomic layer deposition
    • LHAR
    • lateral high aspect ratio structures
    • conformality analysis

    Cite this

    Puurunen, R., Ylivaara, O., Grigoras, K., & Ylilammi, M. (2017). Thin film conformality analysis with microscopic all-silicon lateral high aspect ratio structures. Abstract from 17th International Conference on Atomic Layer Deposition, ALD 2017, Denver, United States.
    Puurunen, Riikka ; Ylivaara, Oili ; Grigoras, Kestutis ; Ylilammi, Markku. / Thin film conformality analysis with microscopic all-silicon lateral high aspect ratio structures. Abstract from 17th International Conference on Atomic Layer Deposition, ALD 2017, Denver, United States.
    @conference{adf88abf1578420dabc69bd775ec3dea,
    title = "Thin film conformality analysis with microscopic all-silicon lateral high aspect ratio structures",
    keywords = "ALD, atomic layer deposition, LHAR, lateral high aspect ratio structures, conformality analysis",
    author = "Riikka Puurunen and Oili Ylivaara and Kestutis Grigoras and Markku Ylilammi",
    note = "Project code: 102086; 17th International Conference on Atomic Layer Deposition, ALD 2017, ALD 2017 ; Conference date: 15-07-2017 Through 18-07-2017",
    year = "2017",
    language = "English",

    }

    Puurunen, R, Ylivaara, O, Grigoras, K & Ylilammi, M 2017, 'Thin film conformality analysis with microscopic all-silicon lateral high aspect ratio structures', 17th International Conference on Atomic Layer Deposition, ALD 2017, Denver, United States, 15/07/17 - 18/07/17.

    Thin film conformality analysis with microscopic all-silicon lateral high aspect ratio structures. / Puurunen, Riikka; Ylivaara, Oili; Grigoras, Kestutis; Ylilammi, Markku.

    2017. Abstract from 17th International Conference on Atomic Layer Deposition, ALD 2017, Denver, United States.

    Research output: Contribution to conferenceConference AbstractScientificpeer-review

    TY - CONF

    T1 - Thin film conformality analysis with microscopic all-silicon lateral high aspect ratio structures

    AU - Puurunen, Riikka

    AU - Ylivaara, Oili

    AU - Grigoras, Kestutis

    AU - Ylilammi, Markku

    N1 - Project code: 102086

    PY - 2017

    Y1 - 2017

    KW - ALD

    KW - atomic layer deposition

    KW - LHAR

    KW - lateral high aspect ratio structures

    KW - conformality analysis

    M3 - Conference Abstract

    ER -

    Puurunen R, Ylivaara O, Grigoras K, Ylilammi M. Thin film conformality analysis with microscopic all-silicon lateral high aspect ratio structures. 2017. Abstract from 17th International Conference on Atomic Layer Deposition, ALD 2017, Denver, United States.