Thin film stress measurement and error determination

ALD Al2O3 films with different wafer sizes

Hannele Heikkinen (Corresponding author), Oili Ylivaara, Leif Grönberg, Riikka L. Puurunen

Research output: Chapter in Book/Report/Conference proceedingConference abstract in proceedingsScientific

Original languageEnglish
Title of host publicationTechnical Program & Abstracts
PublisherAmerican Vacuum Society AVS
Publication statusPublished - 2015
Event13th International Baltic Conference on Atomic Layer Deposition, Baltic ALD 2015 - Tartu, Estonia
Duration: 28 Sep 201529 Sep 2015

Conference

Conference13th International Baltic Conference on Atomic Layer Deposition, Baltic ALD 2015
Abbreviated titleBaltic ALD 2015
CountryEstonia
CityTartu
Period28/09/1529/09/15

Cite this

Heikkinen, H., Ylivaara, O., Grönberg, L., & Puurunen, R. L. (2015). Thin film stress measurement and error determination: ALD Al2O3 films with different wafer sizes. In Technical Program & Abstracts American Vacuum Society AVS.
Heikkinen, Hannele ; Ylivaara, Oili ; Grönberg, Leif ; Puurunen, Riikka L. / Thin film stress measurement and error determination : ALD Al2O3 films with different wafer sizes. Technical Program & Abstracts. American Vacuum Society AVS, 2015.
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author = "Hannele Heikkinen and Oili Ylivaara and Leif Gr{\"o}nberg and Puurunen, {Riikka L.}",
note = "Published abstract of a poster presentation Project 74717 MECHALD and 102086 ALDCoE",
year = "2015",
language = "English",
booktitle = "Technical Program & Abstracts",
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Heikkinen, H, Ylivaara, O, Grönberg, L & Puurunen, RL 2015, Thin film stress measurement and error determination: ALD Al2O3 films with different wafer sizes. in Technical Program & Abstracts. American Vacuum Society AVS, 13th International Baltic Conference on Atomic Layer Deposition, Baltic ALD 2015, Tartu, Estonia, 28/09/15.

Thin film stress measurement and error determination : ALD Al2O3 films with different wafer sizes. / Heikkinen, Hannele (Corresponding author); Ylivaara, Oili; Grönberg, Leif; Puurunen, Riikka L.

Technical Program & Abstracts. American Vacuum Society AVS, 2015.

Research output: Chapter in Book/Report/Conference proceedingConference abstract in proceedingsScientific

TY - CHAP

T1 - Thin film stress measurement and error determination

T2 - ALD Al2O3 films with different wafer sizes

AU - Heikkinen, Hannele

AU - Ylivaara, Oili

AU - Grönberg, Leif

AU - Puurunen, Riikka L.

N1 - Published abstract of a poster presentation Project 74717 MECHALD and 102086 ALDCoE

PY - 2015

Y1 - 2015

M3 - Conference abstract in proceedings

BT - Technical Program & Abstracts

PB - American Vacuum Society AVS

ER -

Heikkinen H, Ylivaara O, Grönberg L, Puurunen RL. Thin film stress measurement and error determination: ALD Al2O3 films with different wafer sizes. In Technical Program & Abstracts. American Vacuum Society AVS. 2015