Thin film stress measurement and error determination: ALD Al2O3 films with different wafer sizes

Hannele Heikkinen (Corresponding author), Oili Ylivaara, Leif Grönberg, Riikka L. Puurunen

    Research output: Chapter in Book/Report/Conference proceedingConference abstract in proceedingsScientific

    Original languageEnglish
    Title of host publicationTechnical Program & Abstracts
    PublisherAmerican Vacuum Society (AVS)
    Publication statusPublished - 2015
    Event13th International Baltic Conference on Atomic Layer Deposition, Baltic ALD 2015 - Tartu, Estonia
    Duration: 28 Sep 201529 Sep 2015

    Conference

    Conference13th International Baltic Conference on Atomic Layer Deposition, Baltic ALD 2015
    Abbreviated titleBaltic ALD 2015
    Country/TerritoryEstonia
    CityTartu
    Period28/09/1529/09/15

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