Thin film stress measurement and error determination: ALD Al2O3 films with different wafer sizes

Hannele Heikkinen (Corresponding author), Oili Ylivaara, Leif Grönberg, Riikka L. Puurunen

    Research output: Chapter in Book/Report/Conference proceedingConference abstract in proceedingsScientific

    Original languageEnglish
    Title of host publicationTechnical Program & Abstracts
    PublisherAmerican Vacuum Society AVS
    Publication statusPublished - 2015
    Event13th International Baltic Conference on Atomic Layer Deposition, Baltic ALD 2015 - Tartu, Estonia
    Duration: 28 Sep 201529 Sep 2015

    Conference

    Conference13th International Baltic Conference on Atomic Layer Deposition, Baltic ALD 2015
    Abbreviated titleBaltic ALD 2015
    CountryEstonia
    CityTartu
    Period28/09/1529/09/15

    Cite this

    Heikkinen, H., Ylivaara, O., Grönberg, L., & Puurunen, R. L. (2015). Thin film stress measurement and error determination: ALD Al2O3 films with different wafer sizes. In Technical Program & Abstracts American Vacuum Society AVS.