Thin film stress measurement and error determination: ALD Al2O3 films with different wafer sizes

Hannele Heikkinen (Corresponding author), Oili Ylivaara, Leif Grönberg, Riikka L. Puurunen

    Research output: Chapter in Book/Report/Conference proceedingConference abstract in proceedingsScientific

    Original languageEnglish
    Title of host publicationTechnical Program & Abstracts
    PublisherAmerican Vacuum Society AVS
    Publication statusPublished - 2015
    Event13th International Baltic Conference on Atomic Layer Deposition, Baltic ALD 2015 - Tartu, Estonia
    Duration: 28 Sep 201529 Sep 2015

    Conference

    Conference13th International Baltic Conference on Atomic Layer Deposition, Baltic ALD 2015
    Abbreviated titleBaltic ALD 2015
    CountryEstonia
    CityTartu
    Period28/09/1529/09/15

    Cite this

    Heikkinen, H., Ylivaara, O., Grönberg, L., & Puurunen, R. L. (2015). Thin film stress measurement and error determination: ALD Al2O3 films with different wafer sizes. In Technical Program & Abstracts American Vacuum Society AVS.
    Heikkinen, Hannele ; Ylivaara, Oili ; Grönberg, Leif ; Puurunen, Riikka L. / Thin film stress measurement and error determination : ALD Al2O3 films with different wafer sizes. Technical Program & Abstracts. American Vacuum Society AVS, 2015.
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    author = "Hannele Heikkinen and Oili Ylivaara and Leif Gr{\"o}nberg and Puurunen, {Riikka L.}",
    note = "Published abstract of a poster presentation Project 74717 MECHALD and 102086 ALDCoE",
    year = "2015",
    language = "English",
    booktitle = "Technical Program & Abstracts",
    publisher = "American Vacuum Society AVS",
    address = "United States",

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    Heikkinen, H, Ylivaara, O, Grönberg, L & Puurunen, RL 2015, Thin film stress measurement and error determination: ALD Al2O3 films with different wafer sizes. in Technical Program & Abstracts. American Vacuum Society AVS, 13th International Baltic Conference on Atomic Layer Deposition, Baltic ALD 2015, Tartu, Estonia, 28/09/15.

    Thin film stress measurement and error determination : ALD Al2O3 films with different wafer sizes. / Heikkinen, Hannele (Corresponding author); Ylivaara, Oili; Grönberg, Leif; Puurunen, Riikka L.

    Technical Program & Abstracts. American Vacuum Society AVS, 2015.

    Research output: Chapter in Book/Report/Conference proceedingConference abstract in proceedingsScientific

    TY - CHAP

    T1 - Thin film stress measurement and error determination

    T2 - ALD Al2O3 films with different wafer sizes

    AU - Heikkinen, Hannele

    AU - Ylivaara, Oili

    AU - Grönberg, Leif

    AU - Puurunen, Riikka L.

    N1 - Published abstract of a poster presentation Project 74717 MECHALD and 102086 ALDCoE

    PY - 2015

    Y1 - 2015

    M3 - Conference abstract in proceedings

    BT - Technical Program & Abstracts

    PB - American Vacuum Society AVS

    ER -

    Heikkinen H, Ylivaara O, Grönberg L, Puurunen RL. Thin film stress measurement and error determination: ALD Al2O3 films with different wafer sizes. In Technical Program & Abstracts. American Vacuum Society AVS. 2015