TiO2 films using the MOCVD method and turbulent flow

Ulrika Backman, Ari Auvinen, Jorma Jokiniemi

Research output: Contribution to journalOther journal contributionScientificpeer-review

Original languageEnglish
Pages (from-to)909 - 910
Number of pages2
JournalJournal of Aerosol Science
Volume31
Issue numberSuppl. 1
DOIs
Publication statusPublished - 2000
MoE publication typeA1 Journal article-refereed
EventEuropean Aerosol Conference 2000 - Dublin, Ireland
Duration: 3 Sep 20008 Sep 2000

Cite this

Backman, Ulrika ; Auvinen, Ari ; Jokiniemi, Jorma. / TiO2 films using the MOCVD method and turbulent flow. In: Journal of Aerosol Science. 2000 ; Vol. 31, No. Suppl. 1. pp. 909 - 910.
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year = "2000",
doi = "10.1016/S0021-8502(00)90919-4",
language = "English",
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Backman, U, Auvinen, A & Jokiniemi, J 2000, 'TiO2 films using the MOCVD method and turbulent flow', Journal of Aerosol Science, vol. 31, no. Suppl. 1, pp. 909 - 910. https://doi.org/10.1016/S0021-8502(00)90919-4

TiO2 films using the MOCVD method and turbulent flow. / Backman, Ulrika; Auvinen, Ari; Jokiniemi, Jorma.

In: Journal of Aerosol Science, Vol. 31, No. Suppl. 1, 2000, p. 909 - 910.

Research output: Contribution to journalOther journal contributionScientificpeer-review

TY - JOUR

T1 - TiO2 films using the MOCVD method and turbulent flow

AU - Backman, Ulrika

AU - Auvinen, Ari

AU - Jokiniemi, Jorma

PY - 2000

Y1 - 2000

U2 - 10.1016/S0021-8502(00)90919-4

DO - 10.1016/S0021-8502(00)90919-4

M3 - Other journal contribution

VL - 31

SP - 909

EP - 910

JO - Journal of Aerosol Science

JF - Journal of Aerosol Science

SN - 0021-8502

IS - Suppl. 1

ER -