ToF-SIMS 3d analysis of thin films deposited in high aspect ratio structures via atomic layer deposition and chemical vapor deposition

Alireza M. Kia (Corresponding Author), Nora Haufe, Sajjad Esmaeili, Clemens Mart, Mikko Utriainen, Riikka L. Puurunen, Wenke Weinreich

    Research output: Contribution to journalArticleScientificpeer-review

    20 Citations (Scopus)

    Fingerprint

    Dive into the research topics of 'ToF-SIMS 3d analysis of thin films deposited in high aspect ratio structures via atomic layer deposition and chemical vapor deposition'. Together they form a unique fingerprint.

    INIS

    Keyphrases

    Engineering

    Material Science