Towards plastic electronics: Patterning semiconducting polymers by nanoimprint lithography

M. Behl, J. Seekamp, S. Sankovysh, C.M. Sotomayor Torres, R. Zentel (Corresponding Author), Jouni Ahopelto

    Research output: Contribution to journalArticleScientificpeer-review

    95 Citations (Scopus)

    Abstract

    The direct patterning of functional semiconducting polymers (see Figure) has been achieved with a nanoimprint lithography technique. The room‐temperature process described is time‐saving as repeated temperature cycling is not required. In addition, due to the direct patterning approach the need for further processing steps (plasma treatment) to pattern the underlying semiconducting material is eliminated.
    Original languageEnglish
    Pages (from-to)588-591
    JournalAdvanced Materials
    Volume14
    Issue number8
    DOIs
    Publication statusPublished - 2002
    MoE publication typeA1 Journal article-refereed

    Fingerprint

    Semiconducting polymers
    Nanoimprint lithography
    Functional polymers
    Electronic equipment
    Plastics
    Plasmas
    Processing
    Temperature

    Cite this

    Behl, M. ; Seekamp, J. ; Sankovysh, S. ; Sotomayor Torres, C.M. ; Zentel, R. ; Ahopelto, Jouni. / Towards plastic electronics : Patterning semiconducting polymers by nanoimprint lithography. In: Advanced Materials. 2002 ; Vol. 14, No. 8. pp. 588-591.
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    abstract = "The direct patterning of functional semiconducting polymers (see Figure) has been achieved with a nanoimprint lithography technique. The room‐temperature process described is time‐saving as repeated temperature cycling is not required. In addition, due to the direct patterning approach the need for further processing steps (plasma treatment) to pattern the underlying semiconducting material is eliminated.",
    author = "M. Behl and J. Seekamp and S. Sankovysh and {Sotomayor Torres}, C.M. and R. Zentel and Jouni Ahopelto",
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    Towards plastic electronics : Patterning semiconducting polymers by nanoimprint lithography. / Behl, M.; Seekamp, J.; Sankovysh, S.; Sotomayor Torres, C.M.; Zentel, R. (Corresponding Author); Ahopelto, Jouni.

    In: Advanced Materials, Vol. 14, No. 8, 2002, p. 588-591.

    Research output: Contribution to journalArticleScientificpeer-review

    TY - JOUR

    T1 - Towards plastic electronics

    T2 - Patterning semiconducting polymers by nanoimprint lithography

    AU - Behl, M.

    AU - Seekamp, J.

    AU - Sankovysh, S.

    AU - Sotomayor Torres, C.M.

    AU - Zentel, R.

    AU - Ahopelto, Jouni

    PY - 2002

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    AB - The direct patterning of functional semiconducting polymers (see Figure) has been achieved with a nanoimprint lithography technique. The room‐temperature process described is time‐saving as repeated temperature cycling is not required. In addition, due to the direct patterning approach the need for further processing steps (plasma treatment) to pattern the underlying semiconducting material is eliminated.

    U2 - 10.1002/1521-4095(20020418)14:8<588::AID-ADMA588>3.0.CO;2-K

    DO - 10.1002/1521-4095(20020418)14:8<588::AID-ADMA588>3.0.CO;2-K

    M3 - Article

    VL - 14

    SP - 588

    EP - 591

    JO - Advanced Materials

    JF - Advanced Materials

    SN - 0935-9648

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