Towards plastic electronics: Patterning semiconducting polymers by nanoimprint lithography

M. Behl, J. Seekamp, S. Sankovysh, C.M. Sotomayor Torres, R. Zentel (Corresponding Author), Jouni Ahopelto

    Research output: Contribution to journalArticleScientificpeer-review

    95 Citations (Scopus)


    The direct patterning of functional semiconducting polymers (see Figure) has been achieved with a nanoimprint lithography technique. The room‐temperature process described is time‐saving as repeated temperature cycling is not required. In addition, due to the direct patterning approach the need for further processing steps (plasma treatment) to pattern the underlying semiconducting material is eliminated.
    Original languageEnglish
    Pages (from-to)588-591
    JournalAdvanced Materials
    Issue number8
    Publication statusPublished - 2002
    MoE publication typeA1 Journal article-refereed


    Cite this