Towards plastic electronics: Patterning semiconducting polymers by nanoimprint lithography

M. Behl; J. Seekamp; S. Zankovych; Clivia M. Sotomayor Torres; R. Zentel; Jouni Ahopelto

doi:10.1002/1521-4095(20020418)14:8<588::AID-ADMA588>3.0.CO;2-K

Towards plastic electronics: Patterning semiconducting polymers by nanoimprint lithography

M. Behl
, J. Seekamp
, S. Zankovych
, Clivia M. Sotomayor Torres
, R. Zentel^*
, Jouni Ahopelto

^*Corresponding author for this work

BA6201 RF microsystems

Research output: Contribution to journal › Article › Scientific › peer-review

107 Citations (Scopus)

Abstract

The direct patterning of functional semiconducting polymers (see Figure) has been achieved with a nanoimprint lithography technique. The room-temperature process described is time-saving as repeated temperature cycling is not required. In addition, due to the direct patterning approach the need for further processing steps (plasma treatment) to pattern the underlying semiconducting material is eliminated.

Original language	English
Pages (from-to)	588-591
Journal	Advanced Materials
Volume	14
Issue number	8
DOIs	https://doi.org/10.1002/1521-4095(20020418)14:8<588::AID-ADMA588>3.0.CO;2-K
Publication status	Published - 2002
MoE publication type	A1 Journal article-refereed

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10.1002/1521-4095(20020418)14:8<588::AID-ADMA588>3.0.CO;2-K

Cite this

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title = "Towards plastic electronics: Patterning semiconducting polymers by nanoimprint lithography",

abstract = "The direct patterning of functional semiconducting polymers (see Figure) has been achieved with a nanoimprint lithography technique. The room-temperature process described is time-saving as repeated temperature cycling is not required. In addition, due to the direct patterning approach the need for further processing steps (plasma treatment) to pattern the underlying semiconducting material is eliminated.",

author = "M. Behl and J. Seekamp and S. Zankovych and \{Sotomayor Torres\}, \{Clivia M.\} and R. Zentel and Jouni Ahopelto",

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T1 - Towards plastic electronics

T2 - Patterning semiconducting polymers by nanoimprint lithography

AU - Behl, M.

AU - Seekamp, J.

AU - Zankovych, S.

AU - Sotomayor Torres, Clivia M.

AU - Zentel, R.

AU - Ahopelto, Jouni

PY - 2002

Y1 - 2002

N2 - The direct patterning of functional semiconducting polymers (see Figure) has been achieved with a nanoimprint lithography technique. The room-temperature process described is time-saving as repeated temperature cycling is not required. In addition, due to the direct patterning approach the need for further processing steps (plasma treatment) to pattern the underlying semiconducting material is eliminated.

AB - The direct patterning of functional semiconducting polymers (see Figure) has been achieved with a nanoimprint lithography technique. The room-temperature process described is time-saving as repeated temperature cycling is not required. In addition, due to the direct patterning approach the need for further processing steps (plasma treatment) to pattern the underlying semiconducting material is eliminated.

U2 - 10.1002/1521-4095(20020418)14:8<588::AID-ADMA588>3.0.CO;2-K

DO - 10.1002/1521-4095(20020418)14:8<588::AID-ADMA588>3.0.CO;2-K

M3 - Article

SN - 0935-9648

VL - 14

SP - 588

EP - 591

JO - Advanced Materials

JF - Advanced Materials

IS - 8

ER -

Towards plastic electronics: Patterning semiconducting polymers by nanoimprint lithography

Abstract

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