Towards roll-to-roll manufacturing: organic thin film transistors based on nanoimprinting lithography technique

Teemu Ruotsalainen; Kimmo Solehmainen; Johanna Hiitola-Keinänen; Jukka Hast; Markku Känsäkoski; Herbert Gold; Martin König; Cédric Rolin

doi:10.3850/978-981-07-0319-6_239

Towards roll-to-roll manufacturing: organic thin film transistors based on nanoimprinting lithography technique

Teemu Ruotsalainen
, Kimmo Solehmainen
, Johanna Hiitola-Keinänen
, Jukka Hast
, Markku Känsäkoski
, Herbert Gold
, Martin König
, Cédric Rolin

Research output: Chapter in Book/Report/Conference proceeding › Conference article in proceedings › Scientific › peer-review

Abstract

In this paper bottom gate bottom contact organic thin film transistors utilizing R2R-processes for gate manufacturing, application of dielectric, application of imprint resist, and hot-embossing of source-drain patterns are demonstrated. Also the other process steps involved in the manufacturing process i.e. dry etching, evaporation of source-drain electrodes, lift-off, and evaporation of semiconductor can be made in a roll-to-roll fashion, thus making the manufacturing route roll-to-roll compatible. The work presented in this paper demonstrates that roll-to-roll NIL is applicable to create source-drain structures with channel lengths much smaller than achieved by other traditional R2R-printing techniques.

Original language	English
Title of host publication	Proceedings of the 8th International Conference on Multi-Material Micro Manufacture, 4M 2011
Publisher	Research Publishing Services
Pages	325-327
ISBN (Print)	978-981-07-0319-6
DOIs	https://doi.org/10.3850/978-981-07-0319-6_239
Publication status	Published - 2011
MoE publication type	A4 Article in a conference publication
Event	8th International Conference on Multi-Material Micro Manufacture, 4M 2011 - Stuttgart, Germany Duration: 8 Nov 2011 → 10 Nov 2011

Conference

Conference	8th International Conference on Multi-Material Micro Manufacture, 4M 2011
Abbreviated title	4M 2011
Country/Territory	Germany
City	Stuttgart
Period	8/11/11 → 10/11/11

Keywords

Organic transistor
roll-to-roll
printing
hot-embossing
NIL

Access to Document

10.3850/978-981-07-0319-6_239

Cite this

Ruotsalainen, T., Solehmainen, K., Hiitola-Keinänen, J., Hast, J., Känsäkoski, M., Gold, H., König, M., & Rolin, C. (2011). Towards roll-to-roll manufacturing: organic thin film transistors based on nanoimprinting lithography technique. In Proceedings of the 8th International Conference on Multi-Material Micro Manufacture, 4M 2011 (pp. 325-327). Research Publishing Services. https://doi.org/10.3850/978-981-07-0319-6_239

@inproceedings{3b8a0a3ad0df4566944914061393d678,

title = "Towards roll-to-roll manufacturing: organic thin film transistors based on nanoimprinting lithography technique",

abstract = "In this paper bottom gate bottom contact organic thin film transistors utilizing R2R-processes for gate manufacturing, application of dielectric, application of imprint resist, and hot-embossing of source-drain patterns are demonstrated. Also the other process steps involved in the manufacturing process i.e. dry etching, evaporation of source-drain electrodes, lift-off, and evaporation of semiconductor can be made in a roll-to-roll fashion, thus making the manufacturing route roll-to-roll compatible. The work presented in this paper demonstrates that roll-to-roll NIL is applicable to create source-drain structures with channel lengths much smaller than achieved by other traditional R2R-printing techniques.",

keywords = "Organic transistor, roll-to-roll, printing, hot-embossing, NIL",

author = "Teemu Ruotsalainen and Kimmo Solehmainen and Johanna Hiitola-Kein{\"a}nen and Jukka Hast and Markku K{\"a}ns{\"a}koski and Herbert Gold and Martin K{\"o}nig and C{\'e}dric Rolin",

note = "Project code: 36427; 8th International Conference on Multi-Material Micro Manufacture, 4M 2011, 4M 2011 ; Conference date: 08-11-2011 Through 10-11-2011",

year = "2011",

doi = "10.3850/978-981-07-0319-6\_239",

language = "English",

isbn = "978-981-07-0319-6",

pages = "325--327",

booktitle = "Proceedings of the 8th International Conference on Multi-Material Micro Manufacture, 4M 2011",

publisher = "Research Publishing Services",

address = "Singapore",

}

Ruotsalainen, T, Solehmainen, K, Hiitola-Keinänen, J , Hast, J, Känsäkoski, M, Gold, H, König, M & Rolin, C 2011, Towards roll-to-roll manufacturing: organic thin film transistors based on nanoimprinting lithography technique. in Proceedings of the 8th International Conference on Multi-Material Micro Manufacture, 4M 2011. Research Publishing Services, pp. 325-327, 8th International Conference on Multi-Material Micro Manufacture, 4M 2011, Stuttgart, Germany, 8/11/11. https://doi.org/10.3850/978-981-07-0319-6_239

Towards roll-to-roll manufacturing: organic thin film transistors based on nanoimprinting lithography technique. / Ruotsalainen, Teemu; Solehmainen, Kimmo; Hiitola-Keinänen, Johanna et al.
Proceedings of the 8th International Conference on Multi-Material Micro Manufacture, 4M 2011. Research Publishing Services, 2011. p. 325-327.

Research output: Chapter in Book/Report/Conference proceeding › Conference article in proceedings › Scientific › peer-review

TY - GEN

T1 - Towards roll-to-roll manufacturing: organic thin film transistors based on nanoimprinting lithography technique

AU - Ruotsalainen, Teemu

AU - Solehmainen, Kimmo

AU - Hiitola-Keinänen, Johanna

AU - Hast, Jukka

AU - Känsäkoski, Markku

AU - Gold, Herbert

AU - König, Martin

AU - Rolin, Cédric

N1 - Project code: 36427

PY - 2011

Y1 - 2011

N2 - In this paper bottom gate bottom contact organic thin film transistors utilizing R2R-processes for gate manufacturing, application of dielectric, application of imprint resist, and hot-embossing of source-drain patterns are demonstrated. Also the other process steps involved in the manufacturing process i.e. dry etching, evaporation of source-drain electrodes, lift-off, and evaporation of semiconductor can be made in a roll-to-roll fashion, thus making the manufacturing route roll-to-roll compatible. The work presented in this paper demonstrates that roll-to-roll NIL is applicable to create source-drain structures with channel lengths much smaller than achieved by other traditional R2R-printing techniques.

AB - In this paper bottom gate bottom contact organic thin film transistors utilizing R2R-processes for gate manufacturing, application of dielectric, application of imprint resist, and hot-embossing of source-drain patterns are demonstrated. Also the other process steps involved in the manufacturing process i.e. dry etching, evaporation of source-drain electrodes, lift-off, and evaporation of semiconductor can be made in a roll-to-roll fashion, thus making the manufacturing route roll-to-roll compatible. The work presented in this paper demonstrates that roll-to-roll NIL is applicable to create source-drain structures with channel lengths much smaller than achieved by other traditional R2R-printing techniques.

KW - Organic transistor

KW - roll-to-roll

KW - printing

KW - hot-embossing

KW - NIL

U2 - 10.3850/978-981-07-0319-6_239

DO - 10.3850/978-981-07-0319-6_239

M3 - Conference article in proceedings

SN - 978-981-07-0319-6

SP - 325

EP - 327

BT - Proceedings of the 8th International Conference on Multi-Material Micro Manufacture, 4M 2011

PB - Research Publishing Services

T2 - 8th International Conference on Multi-Material Micro Manufacture, 4M 2011

Y2 - 8 November 2011 through 10 November 2011

ER -

Ruotsalainen T, Solehmainen K, Hiitola-Keinänen J , Hast J, Känsäkoski M, Gold H et al. Towards roll-to-roll manufacturing: organic thin film transistors based on nanoimprinting lithography technique. In Proceedings of the 8th International Conference on Multi-Material Micro Manufacture, 4M 2011. Research Publishing Services. 2011. p. 325-327 doi: 10.3850/978-981-07-0319-6_239

Towards roll-to-roll manufacturing: organic thin film transistors based on nanoimprinting lithography technique

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