Transfer of thin Si layers by cold and thermal ion cutting

Keyphrases

• P-type 100%
• Si Layer 100%
• Thermal Ions 100%
• Ion-cutting 100%
• Cold Ions 100%
• Annealing 66%
• Thermal Donors 66%
• Boron Doping 66%
• Mechanical Exfoliation 66%
• Conductivity Type 66%
• High Temperature 33%
• Good Quality 33%
• Boron 33%
• Dissociation 33%
• Annealing Temperature 33%
• Crack Opening 33%
• Cutting Process 33%
• Crystal Orientation 33%
• Ion Effect 33%
• Arsenic Doped 33%
• Si-doped 33%
• Out-diffusion 33%
• Shallow Donors 33%
• Layer Transfer 33%
• Epilayer 33%
• Silicon-on-glass 33%
• Crystalline Boron 33%
• Hydrogen Implantation 33%
• Boron Implantation 33%

INIS

• layers 100%
• ions 100%
• cutting 100%
• boron 66%
• hydrogen 50%
• annealing 50%
• silicon 33%
• doped materials 33%
• bonding 16%
• diffusion 16%
• conversion 16%
• doses 16%
• crystals 16%
• cracks 16%
• orientation 16%
• arsenic 16%
• glass 16%
• dissociation 16%

Material Science

• Boron 100%
• Annealing 50%
• Silicon 50%
• Arsenic 25%
• Epilayers 25%
• Crystal Orientation 25%