TY - JOUR
T1 - Tribological properties of thin films made by atomic layer deposition sliding against silicon
AU - Kilpi, Lauri
AU - Ylivaara, Oili M.E.
AU - Vaajoki, Antti
AU - Liu, Xuwen
AU - Rontu, Ville
AU - Sintonen, Sakari
AU - Haimi, Eero
AU - Malm, Jari
AU - Bosund, Markus
AU - Tuominen, Marko
AU - Sajavaara, Timo
AU - Lipsanen, Harri
AU - Hannula, Simo Pekka
AU - Puurunen, Riikka L.
AU - Ronkainen, Helena
N1 - Project: 102086
Funding Information:
The authors are grateful for Tekes—the Finnish Funding Agency for Innovation, ASM Microchemistry Oy, Beneq Oy, Murata Electronics Oy, Picosun Oy, Okmetic Oyj, and Oxford Instruments Analytical Oy for funding this work carried out in MECHALD project. Special thanks to Okmetic Oyj for providing bulk silicon for manufacturing the silicon pins used in the tribological experiments. Simo Varjus and Saima Ali are acknowledged for their contribution concerning tribological measurements and XRR, respectively. This work is linked to the Finnish Centres of Excellence in Atomic Layer Deposition (Reference No. 251220). L.K. designed the tribological experiments together with H.R. and performed the tribological experiments together with A.V. under supervision of H.R. R.L.P. and O.M.E.Y. were responsible for designing the ALD. sample series. O.M.E.Y. made the Al2O3, TiO2 and ATO growth at VTT. V.R. made the NbN growth at Aalto University; J.M. and T.S. made the 50°C Al2O3 growth at University of Jyv€askyl€a; X.L. and E.H. made nanoindentation measurements under supervision of S.P.H.; M.B. made the PEALD TiN growth; and M.T. made the TiAlCN growth. L.K. interpreted the data and wrote the literature review under supervision of H.R. and R.L.P. S.S. made XRR measurements and analysis under supervision of H.L. Co-authors discussed the results with L.K. and commented on the manuscript at all stages.
Publisher Copyright:
© 2017 Author(s).
Copyright:
Copyright 2018 Elsevier B.V., All rights reserved.
PY - 2018/1/1
Y1 - 2018/1/1
N2 - Interfacial phenomena, such as adhesion, friction, and wear, can dominate the performance and reliability of microelectromechanical (MEMS) devices. Here, thin films made by atomic layer deposition (ALD) were tested for their tribological properties. Tribological tests were carried out with silicon counterpart sliding against ALD thin films in order to simulate the contacts occurring in the MEMS devices. The counterpart was sliding in a linear reciprocating motion against the ALD films with the total sliding distances of 5 and 20 m. Al2O3 and TiO2 coatings with different deposition temperatures were investigated in addition to Al2O3-TiO2-nanolaminate, TiN, NbN, TiAlCN, a-C:H [diamondlike carbon (DLC)] coatings, and uncoated Si. The formation of the tribolayer in the contact area was the dominating phenomenon for friction and wear performance. Hardness, elastic modulus, and crystallinity of the materials were also investigated. The nitride coatings had the most favorable friction and wear performance of the ALD coatings, yet lower friction coefficient was measured with DLC a-C:H coating. These results help us to take steps toward improved coating solutions in, e.g., MEMS applications.
AB - Interfacial phenomena, such as adhesion, friction, and wear, can dominate the performance and reliability of microelectromechanical (MEMS) devices. Here, thin films made by atomic layer deposition (ALD) were tested for their tribological properties. Tribological tests were carried out with silicon counterpart sliding against ALD thin films in order to simulate the contacts occurring in the MEMS devices. The counterpart was sliding in a linear reciprocating motion against the ALD films with the total sliding distances of 5 and 20 m. Al2O3 and TiO2 coatings with different deposition temperatures were investigated in addition to Al2O3-TiO2-nanolaminate, TiN, NbN, TiAlCN, a-C:H [diamondlike carbon (DLC)] coatings, and uncoated Si. The formation of the tribolayer in the contact area was the dominating phenomenon for friction and wear performance. Hardness, elastic modulus, and crystallinity of the materials were also investigated. The nitride coatings had the most favorable friction and wear performance of the ALD coatings, yet lower friction coefficient was measured with DLC a-C:H coating. These results help us to take steps toward improved coating solutions in, e.g., MEMS applications.
UR - http://www.scopus.com/inward/record.url?scp=85040109619&partnerID=8YFLogxK
U2 - 10.1116/1.5003729
DO - 10.1116/1.5003729
M3 - Article
AN - SCOPUS:85040109619
SN - 0734-2101
VL - 36
JO - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
JF - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
IS - 1
M1 - 01A122
ER -