Tribological properties of thin films made by atomic layer deposition sliding against silicon

Lauri Kilpi, Oili M.E. Ylivaara, Antti Vaajoki, Xuwen Liu, Ville Rontu, Sakari Sintonen, Eero Haimi, Jari Malm, Markus Bosund, Marko Tuominen, Timo Sajavaara, Harri Lipsanen, Simo Pekka Hannula, Riikka L. Puurunen, Helena Ronkainen

    Research output: Contribution to journalArticleScientificpeer-review

    8 Citations (Scopus)


    Interfacial phenomena, such as adhesion, friction, and wear, can dominate the performance and reliability of microelectromechanical (MEMS) devices. Here, thin films made by atomic layer deposition (ALD) were tested for their tribological properties. Tribological tests were carried out with silicon counterpart sliding against ALD thin films in order to simulate the contacts occurring in the MEMS devices. The counterpart was sliding in a linear reciprocating motion against the ALD films with the total sliding distances of 5 and 20 m. Al2O3 and TiO2 coatings with different deposition temperatures were investigated in addition to Al2O3-TiO2-nanolaminate, TiN, NbN, TiAlCN, a-C:H [diamondlike carbon (DLC)] coatings, and uncoated Si. The formation of the tribolayer in the contact area was the dominating phenomenon for friction and wear performance. Hardness, elastic modulus, and crystallinity of the materials were also investigated. The nitride coatings had the most favorable friction and wear performance of the ALD coatings, yet lower friction coefficient was measured with DLC a-C:H coating. These results help us to take steps toward improved coating solutions in, e.g., MEMS applications.

    Original languageEnglish
    Article number01A122
    JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
    Issue number1
    Publication statusPublished - 1 Jan 2018
    MoE publication typeA1 Journal article-refereed


    Dive into the research topics of 'Tribological properties of thin films made by atomic layer deposition sliding against silicon'. Together they form a unique fingerprint.

    Cite this