Tribological properties of thin films made by atomic layer deposition sliding against silicon

Lauri Kilpi, Oili M.E. Ylivaara, Antti Vaajoki, Xuwen Liu, Ville Rontu, Sakari Sintonen, Eero Haimi, Jari Malm, Markus Bosund, Marko Tuominen, Timo Sajavaara, Harri Lipsanen, Simo Pekka Hannula, Riikka L. Puurunen, Helena Ronkainen

    Research output: Contribution to journalArticleScientificpeer-review

    2 Citations (Scopus)

    Abstract

    Interfacial phenomena, such as adhesion, friction, and wear, can dominate the performance and reliability of microelectromechanical (MEMS) devices. Here, thin films made by atomic layer deposition (ALD) were tested for their tribological properties. Tribological tests were carried out with silicon counterpart sliding against ALD thin films in order to simulate the contacts occurring in the MEMS devices. The counterpart was sliding in a linear reciprocating motion against the ALD films with the total sliding distances of 5 and 20 m. Al2O3 and TiO2 coatings with different deposition temperatures were investigated in addition to Al2O3-TiO2-nanolaminate, TiN, NbN, TiAlCN, a-C:H [diamondlike carbon (DLC)] coatings, and uncoated Si. The formation of the tribolayer in the contact area was the dominating phenomenon for friction and wear performance. Hardness, elastic modulus, and crystallinity of the materials were also investigated. The nitride coatings had the most favorable friction and wear performance of the ALD coatings, yet lower friction coefficient was measured with DLC a-C:H coating. These results help us to take steps toward improved coating solutions in, e.g., MEMS applications.

    Original languageEnglish
    Article number01A122
    JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
    Volume36
    Issue number1
    DOIs
    Publication statusPublished - 1 Jan 2018
    MoE publication typeA1 Journal article-refereed

    Fingerprint

    Atomic layer deposition
    Silicon
    atomic layer epitaxy
    sliding
    coatings
    Thin films
    Coatings
    microelectromechanical systems
    silicon
    thin films
    friction
    Friction
    MEMS
    Wear of materials
    Carbon
    carbon
    coefficient of friction
    nitrides
    coating
    crystallinity

    Cite this

    Kilpi, Lauri ; Ylivaara, Oili M.E. ; Vaajoki, Antti ; Liu, Xuwen ; Rontu, Ville ; Sintonen, Sakari ; Haimi, Eero ; Malm, Jari ; Bosund, Markus ; Tuominen, Marko ; Sajavaara, Timo ; Lipsanen, Harri ; Hannula, Simo Pekka ; Puurunen, Riikka L. ; Ronkainen, Helena. / Tribological properties of thin films made by atomic layer deposition sliding against silicon. In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 2018 ; Vol. 36, No. 1.
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    title = "Tribological properties of thin films made by atomic layer deposition sliding against silicon",
    abstract = "Interfacial phenomena, such as adhesion, friction, and wear, can dominate the performance and reliability of microelectromechanical (MEMS) devices. Here, thin films made by atomic layer deposition (ALD) were tested for their tribological properties. Tribological tests were carried out with silicon counterpart sliding against ALD thin films in order to simulate the contacts occurring in the MEMS devices. The counterpart was sliding in a linear reciprocating motion against the ALD films with the total sliding distances of 5 and 20 m. Al2O3 and TiO2 coatings with different deposition temperatures were investigated in addition to Al2O3-TiO2-nanolaminate, TiN, NbN, TiAlCN, a-C:H [diamondlike carbon (DLC)] coatings, and uncoated Si. The formation of the tribolayer in the contact area was the dominating phenomenon for friction and wear performance. Hardness, elastic modulus, and crystallinity of the materials were also investigated. The nitride coatings had the most favorable friction and wear performance of the ALD coatings, yet lower friction coefficient was measured with DLC a-C:H coating. These results help us to take steps toward improved coating solutions in, e.g., MEMS applications.",
    author = "Lauri Kilpi and Ylivaara, {Oili M.E.} and Antti Vaajoki and Xuwen Liu and Ville Rontu and Sakari Sintonen and Eero Haimi and Jari Malm and Markus Bosund and Marko Tuominen and Timo Sajavaara and Harri Lipsanen and Hannula, {Simo Pekka} and Puurunen, {Riikka L.} and Helena Ronkainen",
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    Kilpi, L, Ylivaara, OME, Vaajoki, A, Liu, X, Rontu, V, Sintonen, S, Haimi, E, Malm, J, Bosund, M, Tuominen, M, Sajavaara, T, Lipsanen, H, Hannula, SP, Puurunen, RL & Ronkainen, H 2018, 'Tribological properties of thin films made by atomic layer deposition sliding against silicon', Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, vol. 36, no. 1, 01A122. https://doi.org/10.1116/1.5003729

    Tribological properties of thin films made by atomic layer deposition sliding against silicon. / Kilpi, Lauri; Ylivaara, Oili M.E.; Vaajoki, Antti; Liu, Xuwen; Rontu, Ville; Sintonen, Sakari; Haimi, Eero; Malm, Jari; Bosund, Markus; Tuominen, Marko; Sajavaara, Timo; Lipsanen, Harri; Hannula, Simo Pekka; Puurunen, Riikka L.; Ronkainen, Helena.

    In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 36, No. 1, 01A122, 01.01.2018.

    Research output: Contribution to journalArticleScientificpeer-review

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    T1 - Tribological properties of thin films made by atomic layer deposition sliding against silicon

    AU - Kilpi, Lauri

    AU - Ylivaara, Oili M.E.

    AU - Vaajoki, Antti

    AU - Liu, Xuwen

    AU - Rontu, Ville

    AU - Sintonen, Sakari

    AU - Haimi, Eero

    AU - Malm, Jari

    AU - Bosund, Markus

    AU - Tuominen, Marko

    AU - Sajavaara, Timo

    AU - Lipsanen, Harri

    AU - Hannula, Simo Pekka

    AU - Puurunen, Riikka L.

    AU - Ronkainen, Helena

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    PY - 2018/1/1

    Y1 - 2018/1/1

    N2 - Interfacial phenomena, such as adhesion, friction, and wear, can dominate the performance and reliability of microelectromechanical (MEMS) devices. Here, thin films made by atomic layer deposition (ALD) were tested for their tribological properties. Tribological tests were carried out with silicon counterpart sliding against ALD thin films in order to simulate the contacts occurring in the MEMS devices. The counterpart was sliding in a linear reciprocating motion against the ALD films with the total sliding distances of 5 and 20 m. Al2O3 and TiO2 coatings with different deposition temperatures were investigated in addition to Al2O3-TiO2-nanolaminate, TiN, NbN, TiAlCN, a-C:H [diamondlike carbon (DLC)] coatings, and uncoated Si. The formation of the tribolayer in the contact area was the dominating phenomenon for friction and wear performance. Hardness, elastic modulus, and crystallinity of the materials were also investigated. The nitride coatings had the most favorable friction and wear performance of the ALD coatings, yet lower friction coefficient was measured with DLC a-C:H coating. These results help us to take steps toward improved coating solutions in, e.g., MEMS applications.

    AB - Interfacial phenomena, such as adhesion, friction, and wear, can dominate the performance and reliability of microelectromechanical (MEMS) devices. Here, thin films made by atomic layer deposition (ALD) were tested for their tribological properties. Tribological tests were carried out with silicon counterpart sliding against ALD thin films in order to simulate the contacts occurring in the MEMS devices. The counterpart was sliding in a linear reciprocating motion against the ALD films with the total sliding distances of 5 and 20 m. Al2O3 and TiO2 coatings with different deposition temperatures were investigated in addition to Al2O3-TiO2-nanolaminate, TiN, NbN, TiAlCN, a-C:H [diamondlike carbon (DLC)] coatings, and uncoated Si. The formation of the tribolayer in the contact area was the dominating phenomenon for friction and wear performance. Hardness, elastic modulus, and crystallinity of the materials were also investigated. The nitride coatings had the most favorable friction and wear performance of the ALD coatings, yet lower friction coefficient was measured with DLC a-C:H coating. These results help us to take steps toward improved coating solutions in, e.g., MEMS applications.

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