Tunable MOEMS Fabry-Perot interferometer for miniaturized spectral sensing in near-infrared

Anna Rissanen, Rami Mannila, Mikko Tuohiniemi, Jarkko Antila

    Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientificpeer-review

    7 Citations (Scopus)

    Abstract

    This paper presents a novel MOEMS Fabry-Perot interferometer (FPI) process platform for the range of 800-1050 nm. Simulation results including design and optimization of device properties in terms of transmission peak width, tuning range and electrical properties are discussed. Process flow for the device fabrication is presented, with overall process integration and backend dicing steps resulting in successful fabrication yield. The mirrors of the FPI consist of LPCVD (low-pressure chemical vapor) deposited polySi-SiN ?/4-thin film Bragg reflectors, with the air gap formed by sacrificial SiO2 etching in HF vapor. Silicon substrate below the optical aperture is removed by inductively coupled plasma (ICP) etching to ensure transmission in the visible-near infra-red (NIR), which is below silicon transmission range. The characterized optical properties of the chips are compared to the simulated values. Achieved optical aperture diameter size enables utilization of the chips in both imaging as well as single-point spectral sensors.
    Original languageEnglish
    Title of host publicationProceedings of SPIE
    Subtitle of host publicationVolume 8977, MOEMS and Miniaturized Systems XIII, 2014
    PublisherInternational Society for Optics and Photonics SPIE
    Volume8977
    ISBN (Print)978-0-8194-9890-8
    DOIs
    Publication statusPublished - 2014
    MoE publication typeA4 Article in a conference publication
    EventMOEMS and Miniaturized Systems XIII - San Francisco, CA, United States
    Duration: 3 Feb 20146 Feb 2014

    Publication series

    SeriesProceedings of SPIE
    Volume8977
    ISSN0277-786X

    Conference

    ConferenceMOEMS and Miniaturized Systems XIII
    CountryUnited States
    CitySan Francisco, CA
    Period3/02/146/02/14

    Fingerprint

    microoptoelectromechanical systems
    Fabry-Perot interferometers
    apertures
    chips
    vapors
    fabrication
    silicon
    Bragg reflectors
    plasma etching
    low pressure
    platforms
    electrical properties
    tuning
    etching
    mirrors
    optical properties
    optimization
    sensors
    air
    thin films

    Keywords

    • Fabry-Perot interferometers
    • microopto electromechanical systems
    • silicon
    • etching
    • microspectrometers
    • miniature hyperspectral imagers
    • MOEMS
    • near infrared

    Cite this

    Rissanen, A., Mannila, R., Tuohiniemi, M., & Antila, J. (2014). Tunable MOEMS Fabry-Perot interferometer for miniaturized spectral sensing in near-infrared. In Proceedings of SPIE: Volume 8977, MOEMS and Miniaturized Systems XIII, 2014 (Vol. 8977). [89770X] International Society for Optics and Photonics SPIE. Proceedings of SPIE, Vol.. 8977 https://doi.org/10.1117/12.2035732
    Rissanen, Anna ; Mannila, Rami ; Tuohiniemi, Mikko ; Antila, Jarkko. / Tunable MOEMS Fabry-Perot interferometer for miniaturized spectral sensing in near-infrared. Proceedings of SPIE: Volume 8977, MOEMS and Miniaturized Systems XIII, 2014. Vol. 8977 International Society for Optics and Photonics SPIE, 2014. (Proceedings of SPIE, Vol. 8977).
    @inproceedings{07c6d5d232924dbe946154e74b1b90d1,
    title = "Tunable MOEMS Fabry-Perot interferometer for miniaturized spectral sensing in near-infrared",
    abstract = "This paper presents a novel MOEMS Fabry-Perot interferometer (FPI) process platform for the range of 800-1050 nm. Simulation results including design and optimization of device properties in terms of transmission peak width, tuning range and electrical properties are discussed. Process flow for the device fabrication is presented, with overall process integration and backend dicing steps resulting in successful fabrication yield. The mirrors of the FPI consist of LPCVD (low-pressure chemical vapor) deposited polySi-SiN ?/4-thin film Bragg reflectors, with the air gap formed by sacrificial SiO2 etching in HF vapor. Silicon substrate below the optical aperture is removed by inductively coupled plasma (ICP) etching to ensure transmission in the visible-near infra-red (NIR), which is below silicon transmission range. The characterized optical properties of the chips are compared to the simulated values. Achieved optical aperture diameter size enables utilization of the chips in both imaging as well as single-point spectral sensors.",
    keywords = "Fabry-Perot interferometers, microopto electromechanical systems, silicon, etching, microspectrometers, miniature hyperspectral imagers, MOEMS, near infrared",
    author = "Anna Rissanen and Rami Mannila and Mikko Tuohiniemi and Jarkko Antila",
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    language = "English",
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    Rissanen, A, Mannila, R, Tuohiniemi, M & Antila, J 2014, Tunable MOEMS Fabry-Perot interferometer for miniaturized spectral sensing in near-infrared. in Proceedings of SPIE: Volume 8977, MOEMS and Miniaturized Systems XIII, 2014. vol. 8977, 89770X, International Society for Optics and Photonics SPIE, Proceedings of SPIE, vol. 8977, MOEMS and Miniaturized Systems XIII, San Francisco, CA, United States, 3/02/14. https://doi.org/10.1117/12.2035732

    Tunable MOEMS Fabry-Perot interferometer for miniaturized spectral sensing in near-infrared. / Rissanen, Anna; Mannila, Rami; Tuohiniemi, Mikko; Antila, Jarkko.

    Proceedings of SPIE: Volume 8977, MOEMS and Miniaturized Systems XIII, 2014. Vol. 8977 International Society for Optics and Photonics SPIE, 2014. 89770X (Proceedings of SPIE, Vol. 8977).

    Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientificpeer-review

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    AB - This paper presents a novel MOEMS Fabry-Perot interferometer (FPI) process platform for the range of 800-1050 nm. Simulation results including design and optimization of device properties in terms of transmission peak width, tuning range and electrical properties are discussed. Process flow for the device fabrication is presented, with overall process integration and backend dicing steps resulting in successful fabrication yield. The mirrors of the FPI consist of LPCVD (low-pressure chemical vapor) deposited polySi-SiN ?/4-thin film Bragg reflectors, with the air gap formed by sacrificial SiO2 etching in HF vapor. Silicon substrate below the optical aperture is removed by inductively coupled plasma (ICP) etching to ensure transmission in the visible-near infra-red (NIR), which is below silicon transmission range. The characterized optical properties of the chips are compared to the simulated values. Achieved optical aperture diameter size enables utilization of the chips in both imaging as well as single-point spectral sensors.

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    ER -

    Rissanen A, Mannila R, Tuohiniemi M, Antila J. Tunable MOEMS Fabry-Perot interferometer for miniaturized spectral sensing in near-infrared. In Proceedings of SPIE: Volume 8977, MOEMS and Miniaturized Systems XIII, 2014. Vol. 8977. International Society for Optics and Photonics SPIE. 2014. 89770X. (Proceedings of SPIE, Vol. 8977). https://doi.org/10.1117/12.2035732