INIS
transmission
100%
range
100%
fabry-perot interferometer
100%
simulation
66%
devices
66%
chemical vapor deposition
66%
silicon
66%
fabrication
66%
apertures
66%
etching
66%
values
33%
comparative evaluations
33%
design
33%
width
33%
optimization
33%
plasma
33%
substrates
33%
size
33%
sensors
33%
peaks
33%
electrical properties
33%
thin films
33%
optical properties
33%
vapors
33%
air
33%
yields
33%
tuning
33%
low pressure
33%
mirrors
33%
silicon nitrides
33%
Keyphrases
Near-infrared
100%
Fabry-Perot Interferometer
100%
Micro-opto-electro-mechanical Systems (MOEMS)
100%
Spectral Sensing
100%
Optical Aperture
66%
Electrical Properties
33%
Optical Properties
33%
Overall Process
33%
Tuning Range
33%
Low Pressure
33%
Single Point
33%
Visible-infrared
33%
Air Gap
33%
Silicon Substrate
33%
Spectral Sensor
33%
Process Integration
33%
Process Flow
33%
Diameter Size
33%
Low Pressure Chemical Vapor Deposition (LPCVD)
33%
Device Fabrication
33%
Device Property
33%
Aperture Size
33%
Bragg Reflector
33%
Poly-Si
33%
HF Gas
33%
Chemical Vapor
33%
SiO2 Etching
33%
Transmission Peak
33%
Peak Width
33%
Process Platform
33%
Inductively Coupled Plasma Etching
33%
Range Property
33%
Transmission Range
33%
Fabrication Yield
33%
Engineering
Fabry Perot
100%
Perot Interferometer
100%
Simulation Result
33%
Silicon Substrate
33%
Process Integration
33%
Process Flow
33%
Bragg Cell
33%
Thin Films
33%
Inductively Coupled Plasma
33%
Silicon Dioxide
33%
Material Science
Interferometer
100%
Silicon
66%
Device Fabrication
33%
Plasma Etching
33%
Optical Property
33%
Low Pressure Chemical Vapor Deposition
33%
Thin Films
33%