Tuning thermal transport in ultrathin silicon membranes by surface nanoscale engineering

Sanghamitra Neogi (Corresponding Author), J. Sebastian Reparaz, Luiz Felipe C. Pereira, Bartlomiej Graczykowski, Markus R. Wagner, Marianna Sledzinska, Andrey Shchepetov, Mika Prunnila, Jouni Ahopelto, Clivia M. Sotomayor-Torres, Davide Donadio

    Research output: Contribution to journalArticleScientificpeer-review

    69 Citations (Scopus)

    Abstract

    A detailed understanding of the connections of fabrication and processing to structural and thermal properties of low-dimensional nanostructures is essential to design materials and devices for phononics, nanoscale thermal management, and thermoelectric applications. Silicon provides an ideal platform to study the relations between structure and heat transport since its thermal conductivity can be tuned over 2 orders of magnitude by nanostructuring. Combining realistic atomistic modeling and experiments, we unravel the origin of the thermal conductivity reduction in ultrathin suspended silicon membranes, down to a thickness of 4 nm. Heat transport is mostly controlled by surface scattering: rough layers of native oxide at surfaces limit the mean free path of thermal phonons below 100 nm. Removing the oxide layers by chemical processing allows us to tune the thermal conductivity over 1 order of magnitude. Our results guide materials design for future phononic applications, setting the length scale at which nanostructuring affects thermal phonons most effectively.
    Original languageEnglish
    Pages (from-to)3820-3828
    JournalACS Nano
    Volume9
    Issue number4
    DOIs
    Publication statusPublished - 2015
    MoE publication typeA1 Journal article-refereed

    Fingerprint

    Silicon
    thermal conductivity
    Tuning
    tuning
    engineering
    membranes
    Membranes
    Thermal conductivity
    phonons
    silicon
    Phonons
    Oxides
    heat
    oxides
    Surface scattering
    mean free path
    platforms
    Processing
    thermodynamic properties
    Temperature control

    Keywords

    • classical molecular dynamics
    • dispersion relations
    • inelastic light scattering
    • lattice thermal transport
    • phonon engineering
    • quasi-2D system
    • Si membranes
    • two-laser Raman thermometry

    Cite this

    Neogi, S., Reparaz, J. S., Pereira, L. F. C., Graczykowski, B., Wagner, M. R., Sledzinska, M., ... Donadio, D. (2015). Tuning thermal transport in ultrathin silicon membranes by surface nanoscale engineering. ACS Nano, 9(4), 3820-3828. https://doi.org/10.1021/nn506792d
    Neogi, Sanghamitra ; Reparaz, J. Sebastian ; Pereira, Luiz Felipe C. ; Graczykowski, Bartlomiej ; Wagner, Markus R. ; Sledzinska, Marianna ; Shchepetov, Andrey ; Prunnila, Mika ; Ahopelto, Jouni ; Sotomayor-Torres, Clivia M. ; Donadio, Davide. / Tuning thermal transport in ultrathin silicon membranes by surface nanoscale engineering. In: ACS Nano. 2015 ; Vol. 9, No. 4. pp. 3820-3828.
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    title = "Tuning thermal transport in ultrathin silicon membranes by surface nanoscale engineering",
    abstract = "A detailed understanding of the connections of fabrication and processing to structural and thermal properties of low-dimensional nanostructures is essential to design materials and devices for phononics, nanoscale thermal management, and thermoelectric applications. Silicon provides an ideal platform to study the relations between structure and heat transport since its thermal conductivity can be tuned over 2 orders of magnitude by nanostructuring. Combining realistic atomistic modeling and experiments, we unravel the origin of the thermal conductivity reduction in ultrathin suspended silicon membranes, down to a thickness of 4 nm. Heat transport is mostly controlled by surface scattering: rough layers of native oxide at surfaces limit the mean free path of thermal phonons below 100 nm. Removing the oxide layers by chemical processing allows us to tune the thermal conductivity over 1 order of magnitude. Our results guide materials design for future phononic applications, setting the length scale at which nanostructuring affects thermal phonons most effectively.",
    keywords = "classical molecular dynamics, dispersion relations, inelastic light scattering, lattice thermal transport, phonon engineering, quasi-2D system, Si membranes, two-laser Raman thermometry",
    author = "Sanghamitra Neogi and Reparaz, {J. Sebastian} and Pereira, {Luiz Felipe C.} and Bartlomiej Graczykowski and Wagner, {Markus R.} and Marianna Sledzinska and Andrey Shchepetov and Mika Prunnila and Jouni Ahopelto and Sotomayor-Torres, {Clivia M.} and Davide Donadio",
    year = "2015",
    doi = "10.1021/nn506792d",
    language = "English",
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    Neogi, S, Reparaz, JS, Pereira, LFC, Graczykowski, B, Wagner, MR, Sledzinska, M, Shchepetov, A, Prunnila, M, Ahopelto, J, Sotomayor-Torres, CM & Donadio, D 2015, 'Tuning thermal transport in ultrathin silicon membranes by surface nanoscale engineering', ACS Nano, vol. 9, no. 4, pp. 3820-3828. https://doi.org/10.1021/nn506792d

    Tuning thermal transport in ultrathin silicon membranes by surface nanoscale engineering. / Neogi, Sanghamitra (Corresponding Author); Reparaz, J. Sebastian; Pereira, Luiz Felipe C.; Graczykowski, Bartlomiej; Wagner, Markus R.; Sledzinska, Marianna; Shchepetov, Andrey; Prunnila, Mika; Ahopelto, Jouni; Sotomayor-Torres, Clivia M.; Donadio, Davide.

    In: ACS Nano, Vol. 9, No. 4, 2015, p. 3820-3828.

    Research output: Contribution to journalArticleScientificpeer-review

    TY - JOUR

    T1 - Tuning thermal transport in ultrathin silicon membranes by surface nanoscale engineering

    AU - Neogi, Sanghamitra

    AU - Reparaz, J. Sebastian

    AU - Pereira, Luiz Felipe C.

    AU - Graczykowski, Bartlomiej

    AU - Wagner, Markus R.

    AU - Sledzinska, Marianna

    AU - Shchepetov, Andrey

    AU - Prunnila, Mika

    AU - Ahopelto, Jouni

    AU - Sotomayor-Torres, Clivia M.

    AU - Donadio, Davide

    PY - 2015

    Y1 - 2015

    N2 - A detailed understanding of the connections of fabrication and processing to structural and thermal properties of low-dimensional nanostructures is essential to design materials and devices for phononics, nanoscale thermal management, and thermoelectric applications. Silicon provides an ideal platform to study the relations between structure and heat transport since its thermal conductivity can be tuned over 2 orders of magnitude by nanostructuring. Combining realistic atomistic modeling and experiments, we unravel the origin of the thermal conductivity reduction in ultrathin suspended silicon membranes, down to a thickness of 4 nm. Heat transport is mostly controlled by surface scattering: rough layers of native oxide at surfaces limit the mean free path of thermal phonons below 100 nm. Removing the oxide layers by chemical processing allows us to tune the thermal conductivity over 1 order of magnitude. Our results guide materials design for future phononic applications, setting the length scale at which nanostructuring affects thermal phonons most effectively.

    AB - A detailed understanding of the connections of fabrication and processing to structural and thermal properties of low-dimensional nanostructures is essential to design materials and devices for phononics, nanoscale thermal management, and thermoelectric applications. Silicon provides an ideal platform to study the relations between structure and heat transport since its thermal conductivity can be tuned over 2 orders of magnitude by nanostructuring. Combining realistic atomistic modeling and experiments, we unravel the origin of the thermal conductivity reduction in ultrathin suspended silicon membranes, down to a thickness of 4 nm. Heat transport is mostly controlled by surface scattering: rough layers of native oxide at surfaces limit the mean free path of thermal phonons below 100 nm. Removing the oxide layers by chemical processing allows us to tune the thermal conductivity over 1 order of magnitude. Our results guide materials design for future phononic applications, setting the length scale at which nanostructuring affects thermal phonons most effectively.

    KW - classical molecular dynamics

    KW - dispersion relations

    KW - inelastic light scattering

    KW - lattice thermal transport

    KW - phonon engineering

    KW - quasi-2D system

    KW - Si membranes

    KW - two-laser Raman thermometry

    U2 - 10.1021/nn506792d

    DO - 10.1021/nn506792d

    M3 - Article

    VL - 9

    SP - 3820

    EP - 3828

    JO - ACS Nano

    JF - ACS Nano

    SN - 1936-0851

    IS - 4

    ER -

    Neogi S, Reparaz JS, Pereira LFC, Graczykowski B, Wagner MR, Sledzinska M et al. Tuning thermal transport in ultrathin silicon membranes by surface nanoscale engineering. ACS Nano. 2015;9(4):3820-3828. https://doi.org/10.1021/nn506792d