Tuning thermal transport in ultrathin silicon membranes by surface nanoscale engineering

Sanghamitra Neogi (Corresponding Author), J. Sebastian Reparaz, Luiz Felipe C. Pereira, Bartlomiej Graczykowski, Markus R. Wagner, Marianna Sledzinska, Andrey Shchepetov, Mika Prunnila, Jouni Ahopelto, Clivia M. Sotomayor-Torres, Davide Donadio

    Research output: Contribution to journalArticleScientificpeer-review

    105 Citations (Scopus)


    A detailed understanding of the connections of fabrication and processing to structural and thermal properties of low-dimensional nanostructures is essential to design materials and devices for phononics, nanoscale thermal management, and thermoelectric applications. Silicon provides an ideal platform to study the relations between structure and heat transport since its thermal conductivity can be tuned over 2 orders of magnitude by nanostructuring. Combining realistic atomistic modeling and experiments, we unravel the origin of the thermal conductivity reduction in ultrathin suspended silicon membranes, down to a thickness of 4 nm. Heat transport is mostly controlled by surface scattering: rough layers of native oxide at surfaces limit the mean free path of thermal phonons below 100 nm. Removing the oxide layers by chemical processing allows us to tune the thermal conductivity over 1 order of magnitude. Our results guide materials design for future phononic applications, setting the length scale at which nanostructuring affects thermal phonons most effectively.
    Original languageEnglish
    Pages (from-to)3820-3828
    JournalACS Nano
    Issue number4
    Publication statusPublished - 2015
    MoE publication typeA1 Journal article-refereed


    • classical molecular dynamics
    • dispersion relations
    • inelastic light scattering
    • lattice thermal transport
    • phonon engineering
    • quasi-2D system
    • Si membranes
    • two-laser Raman thermometry


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