### Abstract

_{2 }is investigated using Monte Carlo simulations and error models derived for the characterization measurements of three photometers. Both random and biased types of errors are used simultaneously to model the measurement noise, drift of the light source, alignment of the photometer, and the errors of the rotary stage. The values of f

_{2}obtained for each azimuth angle of the photometer are sensitive to the asymmetry of the directional response. It is shown by variation of the photometer symmetry that the changes in the value of f

_{2}calculated as an average of all simulated values are small. It is further demonstrated that with typical measurement distances the quality index f

_{2}can be sensitive to the position of the axis of rotation with respect to the receiving plane of the photometer. The simulated f

_{2}values of the three photometers with expanded uncertainties (k = 2) are (4.325 ± 0.035)%, (1.698 ± 0.027)% and (4.315 ± 0.030)%.

Original language | English |
---|---|

Pages (from-to) | 727-736 |

Number of pages | 9 |

Journal | Metrologia |

Volume | 49 |

Issue number | 6 |

DOIs | |

Publication status | Published - 2012 |

MoE publication type | A1 Journal article-refereed |

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_{2}using Monte Carlo simulation.

*Metrologia*,

*49*(6), 727-736. https://doi.org/10.1088/0026-1394/49/6/727

}

_{2}using Monte Carlo simulation',

*Metrologia*, vol. 49, no. 6, pp. 727-736. https://doi.org/10.1088/0026-1394/49/6/727

**Uncertainty analysis of photometer directional response index f _{2} using Monte Carlo simulation.** / Poikonen, Tuomas; Blattner, Peter; Kärhä, Petri; Ikonen, Erkki.

Research output: Contribution to journal › Article › Scientific › peer-review

TY - JOUR

T1 - Uncertainty analysis of photometer directional response index f2 using Monte Carlo simulation

AU - Poikonen, Tuomas

AU - Blattner, Peter

AU - Kärhä, Petri

AU - Ikonen, Erkki

PY - 2012

Y1 - 2012

N2 - The uncertainty of the photometer directional response index f2 is investigated using Monte Carlo simulations and error models derived for the characterization measurements of three photometers. Both random and biased types of errors are used simultaneously to model the measurement noise, drift of the light source, alignment of the photometer, and the errors of the rotary stage. The values of f2 obtained for each azimuth angle of the photometer are sensitive to the asymmetry of the directional response. It is shown by variation of the photometer symmetry that the changes in the value of f2 calculated as an average of all simulated values are small. It is further demonstrated that with typical measurement distances the quality index f2 can be sensitive to the position of the axis of rotation with respect to the receiving plane of the photometer. The simulated f2 values of the three photometers with expanded uncertainties (k = 2) are (4.325 ± 0.035)%, (1.698 ± 0.027)% and (4.315 ± 0.030)%.

AB - The uncertainty of the photometer directional response index f2 is investigated using Monte Carlo simulations and error models derived for the characterization measurements of three photometers. Both random and biased types of errors are used simultaneously to model the measurement noise, drift of the light source, alignment of the photometer, and the errors of the rotary stage. The values of f2 obtained for each azimuth angle of the photometer are sensitive to the asymmetry of the directional response. It is shown by variation of the photometer symmetry that the changes in the value of f2 calculated as an average of all simulated values are small. It is further demonstrated that with typical measurement distances the quality index f2 can be sensitive to the position of the axis of rotation with respect to the receiving plane of the photometer. The simulated f2 values of the three photometers with expanded uncertainties (k = 2) are (4.325 ± 0.035)%, (1.698 ± 0.027)% and (4.315 ± 0.030)%.

U2 - 10.1088/0026-1394/49/6/727

DO - 10.1088/0026-1394/49/6/727

M3 - Article

VL - 49

SP - 727

EP - 736

JO - Metrologia

JF - Metrologia

SN - 0026-1394

IS - 6

ER -

_{2}using Monte Carlo simulation. Metrologia. 2012;49(6):727-736. https://doi.org/10.1088/0026-1394/49/6/727