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"Universal" barrier cmp slurry for use with low dielectric constant interlayer dielectrics
Janos Farkas (Inventor)
, Philippe Monnoyer (Inventor)
, Brad Smith (Inventor)
, Mark Zaleski (Inventor)
Not published at VTT
Freescale Semiconductor Inc.
Research output
:
Patent
›
Patent application
Overview
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INIS
barriers
100%
dielectrics
100%
slurries
100%
dielectric constant
100%
polishing
75%
layers
50%
metals
50%
dielectric materials
50%
diffusion barriers
50%
interfaces
25%
processing
25%
additives
25%
removal
25%
barrier layer
25%
semiconductor materials
25%
mixing
25%
mechanical polishing
25%
Keyphrases
Low Dielectric Constant Materials
100%
Metal Diffusion
100%
Interlayer Dielectric
100%
Slurry Mixing
50%
Low-k Dielectric
50%
Material Science
Permittivity
100%
Dielectric Material
100%
Chemical Mechanical Planarization
25%
Engineering
Cmp Slurry
100%
Chemical Mechanical Polishing
25%