Use of electrical test structures to characterize trench profiles etched on SOI wafers
- Jyrki Kiihamäki
- , Hannu Kattelus
- , Jani Karttunen
- , Nadine Guillaume
- National Institute of Standards and Technology (NIST)
- George Washington University
Research output: Chapter in Book/Report/Conference proceeding › Conference article in proceedings › Scientific › peer-review
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