UV step and stamp imprint lithography using transparent polymer stamp

Tomi Haatainen, Tapio Mäkelä, Jouni Ahopelto, Y. Kawaguchi, G. Lecarpentier

Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientific

Abstract

In this work, we have imprinted features down to 50 nm by UV-SSIL using a transparent polymer stamp with a patterned mesa. The structure of the polymer stamp consists of a patterned polymer layer on a small quartz mesa on top of a quartz support. The patterning of the transparent stamp was done using a silicon master, which fabricated using electron beam lithography and dry etching. The submicron features of the silicon stamp was transferred into polymer stamp by SSIL using NPS300 Nanoimprinting Stepper. The advantage of using a small mesa, is ability to confine pressure into small area to decrease residual thickness. Also, a mesa with small surface area enables better adaptation to the surface topography of the substrate.
Original languageEnglish
Title of host publicationProceedings of the XLIII Annual Conference of the Finnish Physical Society. Espoo, Finland, 12-14 March 2009
EditorsPatrik Laiho
Place of PublicationEspoo
PublisherHelsinki University of Technology
ISBN (Print)978-951-22-9793-1
Publication statusPublished - 2009
MoE publication typeB3 Non-refereed article in conference proceedings
EventXLIII Annual Conference of the Finnish Physical Society - Espoo, Finland
Duration: 12 Mar 200914 Mar 2009

Conference

ConferenceXLIII Annual Conference of the Finnish Physical Society
CountryFinland
CityEspoo
Period12/03/0914/03/09

Fingerprint

mesas
lithography
polymers
quartz
silicon
topography
etching
electron beams

Keywords

  • UVNIL
  • UV-SSIL

Cite this

Haatainen, T., Mäkelä, T., Ahopelto, J., Kawaguchi, Y., & Lecarpentier, G. (2009). UV step and stamp imprint lithography using transparent polymer stamp. In P. Laiho (Ed.), Proceedings of the XLIII Annual Conference of the Finnish Physical Society. Espoo, Finland, 12-14 March 2009 [88] Espoo: Helsinki University of Technology.
Haatainen, Tomi ; Mäkelä, Tapio ; Ahopelto, Jouni ; Kawaguchi, Y. ; Lecarpentier, G. / UV step and stamp imprint lithography using transparent polymer stamp. Proceedings of the XLIII Annual Conference of the Finnish Physical Society. Espoo, Finland, 12-14 March 2009. editor / Patrik Laiho. Espoo : Helsinki University of Technology, 2009.
@inproceedings{c9c32430db0040c8bda73a3f38b75e57,
title = "UV step and stamp imprint lithography using transparent polymer stamp",
abstract = "In this work, we have imprinted features down to 50 nm by UV-SSIL using a transparent polymer stamp with a patterned mesa. The structure of the polymer stamp consists of a patterned polymer layer on a small quartz mesa on top of a quartz support. The patterning of the transparent stamp was done using a silicon master, which fabricated using electron beam lithography and dry etching. The submicron features of the silicon stamp was transferred into polymer stamp by SSIL using NPS300 Nanoimprinting Stepper. The advantage of using a small mesa, is ability to confine pressure into small area to decrease residual thickness. Also, a mesa with small surface area enables better adaptation to the surface topography of the substrate.",
keywords = "UVNIL, UV-SSIL",
author = "Tomi Haatainen and Tapio M{\"a}kel{\"a} and Jouni Ahopelto and Y. Kawaguchi and G. Lecarpentier",
year = "2009",
language = "English",
isbn = "978-951-22-9793-1",
editor = "Patrik Laiho",
booktitle = "Proceedings of the XLIII Annual Conference of the Finnish Physical Society. Espoo, Finland, 12-14 March 2009",
publisher = "Helsinki University of Technology",
address = "Finland",

}

Haatainen, T, Mäkelä, T, Ahopelto, J, Kawaguchi, Y & Lecarpentier, G 2009, UV step and stamp imprint lithography using transparent polymer stamp. in P Laiho (ed.), Proceedings of the XLIII Annual Conference of the Finnish Physical Society. Espoo, Finland, 12-14 March 2009., 88, Helsinki University of Technology, Espoo, XLIII Annual Conference of the Finnish Physical Society, Espoo, Finland, 12/03/09.

UV step and stamp imprint lithography using transparent polymer stamp. / Haatainen, Tomi; Mäkelä, Tapio; Ahopelto, Jouni; Kawaguchi, Y.; Lecarpentier, G.

Proceedings of the XLIII Annual Conference of the Finnish Physical Society. Espoo, Finland, 12-14 March 2009. ed. / Patrik Laiho. Espoo : Helsinki University of Technology, 2009. 88.

Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientific

TY - GEN

T1 - UV step and stamp imprint lithography using transparent polymer stamp

AU - Haatainen, Tomi

AU - Mäkelä, Tapio

AU - Ahopelto, Jouni

AU - Kawaguchi, Y.

AU - Lecarpentier, G.

PY - 2009

Y1 - 2009

N2 - In this work, we have imprinted features down to 50 nm by UV-SSIL using a transparent polymer stamp with a patterned mesa. The structure of the polymer stamp consists of a patterned polymer layer on a small quartz mesa on top of a quartz support. The patterning of the transparent stamp was done using a silicon master, which fabricated using electron beam lithography and dry etching. The submicron features of the silicon stamp was transferred into polymer stamp by SSIL using NPS300 Nanoimprinting Stepper. The advantage of using a small mesa, is ability to confine pressure into small area to decrease residual thickness. Also, a mesa with small surface area enables better adaptation to the surface topography of the substrate.

AB - In this work, we have imprinted features down to 50 nm by UV-SSIL using a transparent polymer stamp with a patterned mesa. The structure of the polymer stamp consists of a patterned polymer layer on a small quartz mesa on top of a quartz support. The patterning of the transparent stamp was done using a silicon master, which fabricated using electron beam lithography and dry etching. The submicron features of the silicon stamp was transferred into polymer stamp by SSIL using NPS300 Nanoimprinting Stepper. The advantage of using a small mesa, is ability to confine pressure into small area to decrease residual thickness. Also, a mesa with small surface area enables better adaptation to the surface topography of the substrate.

KW - UVNIL

KW - UV-SSIL

M3 - Conference article in proceedings

SN - 978-951-22-9793-1

BT - Proceedings of the XLIII Annual Conference of the Finnish Physical Society. Espoo, Finland, 12-14 March 2009

A2 - Laiho, Patrik

PB - Helsinki University of Technology

CY - Espoo

ER -

Haatainen T, Mäkelä T, Ahopelto J, Kawaguchi Y, Lecarpentier G. UV step and stamp imprint lithography using transparent polymer stamp. In Laiho P, editor, Proceedings of the XLIII Annual Conference of the Finnish Physical Society. Espoo, Finland, 12-14 March 2009. Espoo: Helsinki University of Technology. 2009. 88