UV step and stamp imprint lithography using transparent polymer stamp

Tomi Haatainen, Tapio Mäkelä, Jouni Ahopelto, Y. Kawaguchi, G. Lecarpentier

    Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientific

    Abstract

    In this work, we have imprinted features down to 50 nm by UV-SSIL using a transparent polymer stamp with a patterned mesa. The structure of the polymer stamp consists of a patterned polymer layer on a small quartz mesa on top of a quartz support. The patterning of the transparent stamp was done using a silicon master, which fabricated using electron beam lithography and dry etching. The submicron features of the silicon stamp was transferred into polymer stamp by SSIL using NPS300 Nanoimprinting Stepper. The advantage of using a small mesa, is ability to confine pressure into small area to decrease residual thickness. Also, a mesa with small surface area enables better adaptation to the surface topography of the substrate.
    Original languageEnglish
    Title of host publicationProceedings of the XLIII Annual Conference of the Finnish Physical Society. Espoo, Finland, 12-14 March 2009
    EditorsPatrik Laiho
    Place of PublicationEspoo
    PublisherHelsinki University of Technology
    ISBN (Print)978-951-22-9793-1
    Publication statusPublished - 2009
    MoE publication typeB3 Non-refereed article in conference proceedings
    EventXLIII Annual Conference of the Finnish Physical Society - Espoo, Finland
    Duration: 12 Mar 200914 Mar 2009

    Conference

    ConferenceXLIII Annual Conference of the Finnish Physical Society
    CountryFinland
    CityEspoo
    Period12/03/0914/03/09

    Keywords

    • UVNIL
    • UV-SSIL

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