UV Step and Stamp Imprint Lithography using Transparent Polymer Stamp

Tomi Haatainen, Päivi Majander, Tapio Mäkelä, Jouni Ahopelto, Yasuhide Kawaguchi, Gilbert Lecarpentier

Research output: Chapter in Book/Report/Conference proceedingConference abstract in proceedingsScientific

Abstract

In this work, we have imprinted features down to 50 nm by UV-SSIL using a transparent polymer stamp with a patterned mesa. The structure of the polymer stamp consists of a patterned polymer layer on a small quartz mesa on top of a quartz support. The patterning of the transparent stamp was done using a silicon master, which fabricated using electron beam lithography and dry etching. The submicron features of the silicon stamp was transferred into polymer stamp by SSIL using NPS300 Nanoimprinting Stepper. The advantage of using a small mesa, is ability to confine pressure into small area to decrease residual thickness. Also, a mesa with small surface area enables better adaptation to the surface topography of the substrate.
Original languageEnglish
Title of host publicationDigest of The 7th International Conference on Nanoimprint and Nanoprint Technology (NNT'08). Kyoto, Japan, 13 - 15 Oct. 2008
PublisherJapan Society of Applied Physics
Pages146-147
ISBN (Print)4-9902472-6-4
Publication statusPublished - 2008
MoE publication typeNot Eligible

Fingerprint

mesas
lithography
polymers
quartz
silicon
topography
etching
electron beams

Keywords

  • nanoimprint lithography
  • UV imprinting

Cite this

Haatainen, T., Majander, P., Mäkelä, T., Ahopelto, J., Kawaguchi, Y., & Lecarpentier, G. (2008). UV Step and Stamp Imprint Lithography using Transparent Polymer Stamp. In Digest of The 7th International Conference on Nanoimprint and Nanoprint Technology (NNT'08). Kyoto, Japan, 13 - 15 Oct. 2008 (pp. 146-147). Japan Society of Applied Physics.
Haatainen, Tomi ; Majander, Päivi ; Mäkelä, Tapio ; Ahopelto, Jouni ; Kawaguchi, Yasuhide ; Lecarpentier, Gilbert. / UV Step and Stamp Imprint Lithography using Transparent Polymer Stamp. Digest of The 7th International Conference on Nanoimprint and Nanoprint Technology (NNT'08). Kyoto, Japan, 13 - 15 Oct. 2008. Japan Society of Applied Physics, 2008. pp. 146-147
@inbook{d46887b2cdf74c24936a1868197085a2,
title = "UV Step and Stamp Imprint Lithography using Transparent Polymer Stamp",
abstract = "In this work, we have imprinted features down to 50 nm by UV-SSIL using a transparent polymer stamp with a patterned mesa. The structure of the polymer stamp consists of a patterned polymer layer on a small quartz mesa on top of a quartz support. The patterning of the transparent stamp was done using a silicon master, which fabricated using electron beam lithography and dry etching. The submicron features of the silicon stamp was transferred into polymer stamp by SSIL using NPS300 Nanoimprinting Stepper. The advantage of using a small mesa, is ability to confine pressure into small area to decrease residual thickness. Also, a mesa with small surface area enables better adaptation to the surface topography of the substrate.",
keywords = "nanoimprint lithography, UV imprinting",
author = "Tomi Haatainen and P{\"a}ivi Majander and Tapio M{\"a}kel{\"a} and Jouni Ahopelto and Yasuhide Kawaguchi and Gilbert Lecarpentier",
note = "2 page abstracts reviewed and published",
year = "2008",
language = "English",
isbn = "4-9902472-6-4",
pages = "146--147",
booktitle = "Digest of The 7th International Conference on Nanoimprint and Nanoprint Technology (NNT'08). Kyoto, Japan, 13 - 15 Oct. 2008",
publisher = "Japan Society of Applied Physics",
address = "Japan",

}

Haatainen, T, Majander, P, Mäkelä, T, Ahopelto, J, Kawaguchi, Y & Lecarpentier, G 2008, UV Step and Stamp Imprint Lithography using Transparent Polymer Stamp. in Digest of The 7th International Conference on Nanoimprint and Nanoprint Technology (NNT'08). Kyoto, Japan, 13 - 15 Oct. 2008. Japan Society of Applied Physics, pp. 146-147.

UV Step and Stamp Imprint Lithography using Transparent Polymer Stamp. / Haatainen, Tomi; Majander, Päivi; Mäkelä, Tapio; Ahopelto, Jouni; Kawaguchi, Yasuhide; Lecarpentier, Gilbert.

Digest of The 7th International Conference on Nanoimprint and Nanoprint Technology (NNT'08). Kyoto, Japan, 13 - 15 Oct. 2008. Japan Society of Applied Physics, 2008. p. 146-147.

Research output: Chapter in Book/Report/Conference proceedingConference abstract in proceedingsScientific

TY - CHAP

T1 - UV Step and Stamp Imprint Lithography using Transparent Polymer Stamp

AU - Haatainen, Tomi

AU - Majander, Päivi

AU - Mäkelä, Tapio

AU - Ahopelto, Jouni

AU - Kawaguchi, Yasuhide

AU - Lecarpentier, Gilbert

N1 - 2 page abstracts reviewed and published

PY - 2008

Y1 - 2008

N2 - In this work, we have imprinted features down to 50 nm by UV-SSIL using a transparent polymer stamp with a patterned mesa. The structure of the polymer stamp consists of a patterned polymer layer on a small quartz mesa on top of a quartz support. The patterning of the transparent stamp was done using a silicon master, which fabricated using electron beam lithography and dry etching. The submicron features of the silicon stamp was transferred into polymer stamp by SSIL using NPS300 Nanoimprinting Stepper. The advantage of using a small mesa, is ability to confine pressure into small area to decrease residual thickness. Also, a mesa with small surface area enables better adaptation to the surface topography of the substrate.

AB - In this work, we have imprinted features down to 50 nm by UV-SSIL using a transparent polymer stamp with a patterned mesa. The structure of the polymer stamp consists of a patterned polymer layer on a small quartz mesa on top of a quartz support. The patterning of the transparent stamp was done using a silicon master, which fabricated using electron beam lithography and dry etching. The submicron features of the silicon stamp was transferred into polymer stamp by SSIL using NPS300 Nanoimprinting Stepper. The advantage of using a small mesa, is ability to confine pressure into small area to decrease residual thickness. Also, a mesa with small surface area enables better adaptation to the surface topography of the substrate.

KW - nanoimprint lithography

KW - UV imprinting

M3 - Conference abstract in proceedings

SN - 4-9902472-6-4

SP - 146

EP - 147

BT - Digest of The 7th International Conference on Nanoimprint and Nanoprint Technology (NNT'08). Kyoto, Japan, 13 - 15 Oct. 2008

PB - Japan Society of Applied Physics

ER -

Haatainen T, Majander P, Mäkelä T, Ahopelto J, Kawaguchi Y, Lecarpentier G. UV Step and Stamp Imprint Lithography using Transparent Polymer Stamp. In Digest of The 7th International Conference on Nanoimprint and Nanoprint Technology (NNT'08). Kyoto, Japan, 13 - 15 Oct. 2008. Japan Society of Applied Physics. 2008. p. 146-147