Wet refinement of dry etched trenches in silicon

Hannu Kattelus

Research output: Contribution to journalArticleScientificpeer-review

5 Citations (Scopus)

Abstract

Deep trenches were etched in single‐crystalline silicon for isolation purposes using combined dry‐wet processing. Reactive ion etching was performed in chlorine‐nitrogen plasmas using chloroform, boron trichloride, or sulfur hexafluoride additives to optimize the trench profile. In all cases, however, imperfections such as barreling or micromasking‐induced trench bottom residue remained after dry etching. A significantly improved profile was obtained with the aid of an additional wet treatment of the dry etched trenches in tetramethyl ammonium hydroxide.

Original languageEnglish
Pages (from-to)3188-3191
JournalJournal of the Electrochemical Society
Volume144
Issue number9
DOIs
Publication statusPublished - 1997
MoE publication typeA1 Journal article-refereed

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