X-ray diffraction and Raman investigations of thickness dependent stress effects on Pb(ZrxTi1-x)O3 thin films

Jyrki Lappalainen; Vilho Lantto; Johannes Frantti; Jussi Hiltunen

doi:10.1063/1.2216895

X-ray diffraction and Raman investigations of thickness dependent stress effects on Pb(Zr_xTi_1-x)O₃ thin films

Jyrki Lappalainen, Vilho Lantto, Johannes Frantti, Jussi Hiltunen

Research output: Contribution to journal › Article › Scientific › peer-review

11 Citations (Scopus)

Abstract

Microstructure, film orientation, and optical transmission spectra of polycrystalline Nd-modified Pb(Zr_xTi_1−x)O₃ films were studied as a function of film thickness. Pulsed laser deposition was used for the fabrication of films with thickness from 80to465nm on single-crystal MgO(100) substrates. Raman spectroscopy, x-ray diffraction, and spectrophotometry measurements were utilized in the film characterization. With the decreasing film thickness, films first oriented with c axis perpendicular to film surface, and then, after some critical thickness, changed to a-axis orientation. At the same time, compressive stress increased up to 1.3GPa and a clear blueshift of the optical absorption edge was found in transmission spectra.

Original language	English
Article number	252901
Journal	Applied Physics Letters
Volume	88
Issue number	25
DOIs	https://doi.org/10.1063/1.2216895
Publication status	Published - 2006
MoE publication type	A1 Journal article-refereed

Keywords

lead
lead compounds
neodymium compounds
ferroelectric materials
ferroelectric thin films
thin films
Raman spectroscopy
x-ray diffraction
stress effects
internal stresses
spectral line shift

Access to Document

10.1063/1.2216895

Cite this

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title = "X-ray diffraction and Raman investigations of thickness dependent stress effects on Pb(ZrxTi1-x)O3 thin films",

abstract = "Microstructure, film orientation, and optical transmission spectra of polycrystalline Nd-modified Pb(ZrxTi1−x)O3 films were studied as a function of film thickness. Pulsed laser deposition was used for the fabrication of films with thickness from 80to465nm on single-crystal MgO(100) substrates. Raman spectroscopy, x-ray diffraction, and spectrophotometry measurements were utilized in the film characterization. With the decreasing film thickness, films first oriented with c axis perpendicular to film surface, and then, after some critical thickness, changed to a-axis orientation. At the same time, compressive stress increased up to 1.3GPa and a clear blueshift of the optical absorption edge was found in transmission spectra.",

keywords = "lead, lead compounds, neodymium compounds, ferroelectric materials, ferroelectric thin films, thin films, Raman spectroscopy, x-ray diffraction, stress effects, internal stresses, spectral line shift",

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T1 - X-ray diffraction and Raman investigations of thickness dependent stress effects on Pb(ZrxTi1-x)O3 thin films

AU - Lappalainen, Jyrki

AU - Lantto, Vilho

AU - Frantti, Johannes

AU - Hiltunen, Jussi

PY - 2006

Y1 - 2006

N2 - Microstructure, film orientation, and optical transmission spectra of polycrystalline Nd-modified Pb(ZrxTi1−x)O3 films were studied as a function of film thickness. Pulsed laser deposition was used for the fabrication of films with thickness from 80to465nm on single-crystal MgO(100) substrates. Raman spectroscopy, x-ray diffraction, and spectrophotometry measurements were utilized in the film characterization. With the decreasing film thickness, films first oriented with c axis perpendicular to film surface, and then, after some critical thickness, changed to a-axis orientation. At the same time, compressive stress increased up to 1.3GPa and a clear blueshift of the optical absorption edge was found in transmission spectra.

AB - Microstructure, film orientation, and optical transmission spectra of polycrystalline Nd-modified Pb(ZrxTi1−x)O3 films were studied as a function of film thickness. Pulsed laser deposition was used for the fabrication of films with thickness from 80to465nm on single-crystal MgO(100) substrates. Raman spectroscopy, x-ray diffraction, and spectrophotometry measurements were utilized in the film characterization. With the decreasing film thickness, films first oriented with c axis perpendicular to film surface, and then, after some critical thickness, changed to a-axis orientation. At the same time, compressive stress increased up to 1.3GPa and a clear blueshift of the optical absorption edge was found in transmission spectra.

KW - lead

KW - lead compounds

KW - neodymium compounds

KW - ferroelectric materials

KW - ferroelectric thin films

KW - thin films

KW - Raman spectroscopy

KW - x-ray diffraction

KW - stress effects

KW - internal stresses

KW - spectral line shift

U2 - 10.1063/1.2216895

DO - 10.1063/1.2216895

M3 - Article

SN - 0003-6951

VL - 88

JO - Applied Physics Letters

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