X-ray reflectivity characterization of atomic layer deposition Al 2O3/TiO2 nanolaminates with ultrathin bilayers

Sakari Sintonen, Saima Ali, Oili M.E. Ylivaara, Riikka L. Puurunen, Harri Lipsanen

Research output: Contribution to journalArticleScientificpeer-review

15 Citations (Scopus)

Abstract

Nanolaminate structures have many prospective uses in mechanical, electrical, and optical applications due to the wide selection of materials and precise control over layer thicknesses. In this work, ultrathin Al 2O3/TiO2 nanolaminate structures deposited by atomic layer deposition from Me3Al, TiCl4, and H 2O precursors with intended bilayer thicknesses ranging from 0.1 to 50 nm were characterized by x-ray reflectivity (XRR) measurements. The measurements were simulated to obtain values for thickness, density, and roughness of constituting layers. XRR analysis shows that the individual layers within the nanolaminate remain discrete for bilayers as thin as 0.8 nm. Further reduction in bilayer thickness produces a composite of the two materials.

Original languageEnglish
Article number01A111
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume32
Issue number1
DOIs
Publication statusPublished - 2014
MoE publication typeA1 Journal article-refereed

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Atomic layer deposition
atomic layer epitaxy
reflectance
X rays
x rays
Surface roughness
Composite materials
roughness
composite materials
titanium tetrachloride

Cite this

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title = "X-ray reflectivity characterization of atomic layer deposition Al 2O3/TiO2 nanolaminates with ultrathin bilayers",
abstract = "Nanolaminate structures have many prospective uses in mechanical, electrical, and optical applications due to the wide selection of materials and precise control over layer thicknesses. In this work, ultrathin Al 2O3/TiO2 nanolaminate structures deposited by atomic layer deposition from Me3Al, TiCl4, and H 2O precursors with intended bilayer thicknesses ranging from 0.1 to 50 nm were characterized by x-ray reflectivity (XRR) measurements. The measurements were simulated to obtain values for thickness, density, and roughness of constituting layers. XRR analysis shows that the individual layers within the nanolaminate remain discrete for bilayers as thin as 0.8 nm. Further reduction in bilayer thickness produces a composite of the two materials.",
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X-ray reflectivity characterization of atomic layer deposition Al 2O3/TiO2 nanolaminates with ultrathin bilayers. / Sintonen, Sakari; Ali, Saima; Ylivaara, Oili M.E.; Puurunen, Riikka L.; Lipsanen, Harri.

In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 32, No. 1, 01A111, 2014.

Research output: Contribution to journalArticleScientificpeer-review

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AU - Sintonen, Sakari

AU - Ali, Saima

AU - Ylivaara, Oili M.E.

AU - Puurunen, Riikka L.

AU - Lipsanen, Harri

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AB - Nanolaminate structures have many prospective uses in mechanical, electrical, and optical applications due to the wide selection of materials and precise control over layer thicknesses. In this work, ultrathin Al 2O3/TiO2 nanolaminate structures deposited by atomic layer deposition from Me3Al, TiCl4, and H 2O precursors with intended bilayer thicknesses ranging from 0.1 to 50 nm were characterized by x-ray reflectivity (XRR) measurements. The measurements were simulated to obtain values for thickness, density, and roughness of constituting layers. XRR analysis shows that the individual layers within the nanolaminate remain discrete for bilayers as thin as 0.8 nm. Further reduction in bilayer thickness produces a composite of the two materials.

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