X-ray reflectivity characterization of atomic layer deposition Al 2O3/TiO2 nanolaminates with ultrathin bilayers

Sakari Sintonen, Saima Ali, Oili M.E. Ylivaara, Riikka L. Puurunen, Harri Lipsanen

    Research output: Contribution to journalArticleScientificpeer-review

    15 Citations (Scopus)

    Abstract

    Nanolaminate structures have many prospective uses in mechanical, electrical, and optical applications due to the wide selection of materials and precise control over layer thicknesses. In this work, ultrathin Al 2O3/TiO2 nanolaminate structures deposited by atomic layer deposition from Me3Al, TiCl4, and H 2O precursors with intended bilayer thicknesses ranging from 0.1 to 50 nm were characterized by x-ray reflectivity (XRR) measurements. The measurements were simulated to obtain values for thickness, density, and roughness of constituting layers. XRR analysis shows that the individual layers within the nanolaminate remain discrete for bilayers as thin as 0.8 nm. Further reduction in bilayer thickness produces a composite of the two materials.

    Original languageEnglish
    Article number01A111
    JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
    Volume32
    Issue number1
    DOIs
    Publication statusPublished - 2014
    MoE publication typeA1 Journal article-refereed

    Fingerprint

    Atomic layer deposition
    atomic layer epitaxy
    reflectance
    X rays
    x rays
    Surface roughness
    Composite materials
    roughness
    composite materials
    titanium tetrachloride

    Cite this

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    title = "X-ray reflectivity characterization of atomic layer deposition Al 2O3/TiO2 nanolaminates with ultrathin bilayers",
    abstract = "Nanolaminate structures have many prospective uses in mechanical, electrical, and optical applications due to the wide selection of materials and precise control over layer thicknesses. In this work, ultrathin Al 2O3/TiO2 nanolaminate structures deposited by atomic layer deposition from Me3Al, TiCl4, and H 2O precursors with intended bilayer thicknesses ranging from 0.1 to 50 nm were characterized by x-ray reflectivity (XRR) measurements. The measurements were simulated to obtain values for thickness, density, and roughness of constituting layers. XRR analysis shows that the individual layers within the nanolaminate remain discrete for bilayers as thin as 0.8 nm. Further reduction in bilayer thickness produces a composite of the two materials.",
    author = "Sakari Sintonen and Saima Ali and Ylivaara, {Oili M.E.} and Puurunen, {Riikka L.} and Harri Lipsanen",
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    X-ray reflectivity characterization of atomic layer deposition Al 2O3/TiO2 nanolaminates with ultrathin bilayers. / Sintonen, Sakari; Ali, Saima; Ylivaara, Oili M.E.; Puurunen, Riikka L.; Lipsanen, Harri.

    In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 32, No. 1, 01A111, 2014.

    Research output: Contribution to journalArticleScientificpeer-review

    TY - JOUR

    T1 - X-ray reflectivity characterization of atomic layer deposition Al 2O3/TiO2 nanolaminates with ultrathin bilayers

    AU - Sintonen, Sakari

    AU - Ali, Saima

    AU - Ylivaara, Oili M.E.

    AU - Puurunen, Riikka L.

    AU - Lipsanen, Harri

    N1 - Project 74717 MECHALD

    PY - 2014

    Y1 - 2014

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    AB - Nanolaminate structures have many prospective uses in mechanical, electrical, and optical applications due to the wide selection of materials and precise control over layer thicknesses. In this work, ultrathin Al 2O3/TiO2 nanolaminate structures deposited by atomic layer deposition from Me3Al, TiCl4, and H 2O precursors with intended bilayer thicknesses ranging from 0.1 to 50 nm were characterized by x-ray reflectivity (XRR) measurements. The measurements were simulated to obtain values for thickness, density, and roughness of constituting layers. XRR analysis shows that the individual layers within the nanolaminate remain discrete for bilayers as thin as 0.8 nm. Further reduction in bilayer thickness produces a composite of the two materials.

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