XeF2 etching of silicon using ALD films as etch stop layers

Oili Ylivaara (Corresponding author), Jaakko Saarilahti, Riikka Puurunen

Research output: Contribution to conferenceConference AbstractScientificpeer-review

Original languageEnglish
Publication statusPublished - 2017
EventJoint EuroCVD 21 - Baltic ALD 15 Conference - Linköping, Sweden
Duration: 11 Jun 201714 Jun 2017

Conference

ConferenceJoint EuroCVD 21 - Baltic ALD 15 Conference
CountrySweden
CityLinköping
Period11/06/1714/06/17

Keywords

  • ALD
  • XeF2
  • etching

Cite this

Ylivaara, O., Saarilahti, J., & Puurunen, R. (2017). XeF2 etching of silicon using ALD films as etch stop layers. Abstract from Joint EuroCVD 21 - Baltic ALD 15 Conference, Linköping, Sweden.
Ylivaara, Oili ; Saarilahti, Jaakko ; Puurunen, Riikka. / XeF2 etching of silicon using ALD films as etch stop layers. Abstract from Joint EuroCVD 21 - Baltic ALD 15 Conference, Linköping, Sweden.
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title = "XeF2 etching of silicon using ALD films as etch stop layers",
keywords = "ALD, XeF2, etching",
author = "Oili Ylivaara and Jaakko Saarilahti and Riikka Puurunen",
note = "Project 102086 ALDCoE; Joint EuroCVD 21 - Baltic ALD 15 Conference ; Conference date: 11-06-2017 Through 14-06-2017",
year = "2017",
language = "English",

}

Ylivaara, O, Saarilahti, J & Puurunen, R 2017, 'XeF2 etching of silicon using ALD films as etch stop layers' Joint EuroCVD 21 - Baltic ALD 15 Conference, Linköping, Sweden, 11/06/17 - 14/06/17, .

XeF2 etching of silicon using ALD films as etch stop layers. / Ylivaara, Oili (Corresponding author); Saarilahti, Jaakko; Puurunen, Riikka.

2017. Abstract from Joint EuroCVD 21 - Baltic ALD 15 Conference, Linköping, Sweden.

Research output: Contribution to conferenceConference AbstractScientificpeer-review

TY - CONF

T1 - XeF2 etching of silicon using ALD films as etch stop layers

AU - Ylivaara, Oili

AU - Saarilahti, Jaakko

AU - Puurunen, Riikka

N1 - Project 102086 ALDCoE

PY - 2017

Y1 - 2017

KW - ALD

KW - XeF2

KW - etching

M3 - Conference Abstract

ER -

Ylivaara O, Saarilahti J, Puurunen R. XeF2 etching of silicon using ALD films as etch stop layers. 2017. Abstract from Joint EuroCVD 21 - Baltic ALD 15 Conference, Linköping, Sweden.