XeF2 etching of silicon using ALD films as etch stop layers

Oili Ylivaara (Corresponding author), Jaakko Saarilahti, Riikka Puurunen

    Research output: Contribution to conferenceConference AbstractScientificpeer-review

    Original languageEnglish
    Publication statusPublished - 2017
    EventJoint EuroCVD 21 - Baltic ALD 15 Conference - Linköping, Sweden
    Duration: 11 Jun 201714 Jun 2017

    Conference

    ConferenceJoint EuroCVD 21 - Baltic ALD 15 Conference
    CountrySweden
    CityLinköping
    Period11/06/1714/06/17

    Keywords

    • ALD
    • XeF2
    • etching

    Cite this

    Ylivaara, O., Saarilahti, J., & Puurunen, R. (2017). XeF2 etching of silicon using ALD films as etch stop layers. Abstract from Joint EuroCVD 21 - Baltic ALD 15 Conference, Linköping, Sweden.
    Ylivaara, Oili ; Saarilahti, Jaakko ; Puurunen, Riikka. / XeF2 etching of silicon using ALD films as etch stop layers. Abstract from Joint EuroCVD 21 - Baltic ALD 15 Conference, Linköping, Sweden.
    @conference{e2744cacaadd4a65ac8e2c550e50b23d,
    title = "XeF2 etching of silicon using ALD films as etch stop layers",
    keywords = "ALD, XeF2, etching",
    author = "Oili Ylivaara and Jaakko Saarilahti and Riikka Puurunen",
    note = "Project 102086 ALDCoE; Joint EuroCVD 21 - Baltic ALD 15 Conference ; Conference date: 11-06-2017 Through 14-06-2017",
    year = "2017",
    language = "English",

    }

    Ylivaara, O, Saarilahti, J & Puurunen, R 2017, 'XeF2 etching of silicon using ALD films as etch stop layers', Joint EuroCVD 21 - Baltic ALD 15 Conference, Linköping, Sweden, 11/06/17 - 14/06/17.

    XeF2 etching of silicon using ALD films as etch stop layers. / Ylivaara, Oili (Corresponding author); Saarilahti, Jaakko; Puurunen, Riikka.

    2017. Abstract from Joint EuroCVD 21 - Baltic ALD 15 Conference, Linköping, Sweden.

    Research output: Contribution to conferenceConference AbstractScientificpeer-review

    TY - CONF

    T1 - XeF2 etching of silicon using ALD films as etch stop layers

    AU - Ylivaara, Oili

    AU - Saarilahti, Jaakko

    AU - Puurunen, Riikka

    N1 - Project 102086 ALDCoE

    PY - 2017

    Y1 - 2017

    KW - ALD

    KW - XeF2

    KW - etching

    M3 - Conference Abstract

    ER -

    Ylivaara O, Saarilahti J, Puurunen R. XeF2 etching of silicon using ALD films as etch stop layers. 2017. Abstract from Joint EuroCVD 21 - Baltic ALD 15 Conference, Linköping, Sweden.