XeF2 etching of silicon using ALD films as etch stop layers

Oili Ylivaara (Corresponding author), Jaakko Saarilahti, Riikka Puurunen

    Research output: Contribution to conferenceConference AbstractScientificpeer-review

    Original languageEnglish
    Publication statusPublished - 2017
    MoE publication typeNot Eligible
    EventJoint EuroCVD 21 - Baltic ALD 15 Conference - Linköping, Sweden
    Duration: 11 Jun 201714 Jun 2017

    Conference

    ConferenceJoint EuroCVD 21 - Baltic ALD 15 Conference
    CountrySweden
    CityLinköping
    Period11/06/1714/06/17

    Keywords

    • ALD
    • XeF2
    • etching
    • OtaNano

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