XeF2 etching of silicon using ALD films as etch stop layers

XeF₂ etching of silicon using ALD films as etch stop layers

^*Corresponding author for this work

Research output: Contribution to conference › Conference Abstract › Scientific › peer-review

Original language	English
Publication status	Published - 2017
MoE publication type	Not Eligible
Event	Joint EuroCVD 21 - Baltic ALD 15 Conference - Linköping, Sweden Duration: 11 Jun 2017 → 14 Jun 2017

Conference	Joint EuroCVD 21 - Baltic ALD 15 Conference
Country/Territory	Sweden
City	Linköping
Period	11/06/17 → 14/06/17

ALDCoE: Finnish Centre of Excellence in Atomic Layer Deposition
Ylivaara, O. M. E. (PI), Ahopelto, J. (Participant), Puurunen, R. L. (Participant) & Grigoras, K. (Participant)
1/01/12 → 31/12/17
Project: Research Council of Finland

@conference{e2744cacaadd4a65ac8e2c550e50b23d,

title = "XeF2 etching of silicon using ALD films as etch stop layers",

keywords = "ALD, XeF2, etching, OtaNano",

author = "Oili Ylivaara and Jaakko Saarilahti and Riikka Puurunen",

note = "Project 102086 ALDCoE; Joint EuroCVD 21 - Baltic ALD 15 Conference ; Conference date: 11-06-2017 Through 14-06-2017",

year = "2017",

language = "English",

}