XeF₂ etching of silicon using ALD films as etch stop layers

Oili Ylivaara^*
, Jaakko Saarilahti
, Riikka Puurunen

^*Corresponding author for this work

VTT (former employee or external)

Research output: Contribution to conference › Conference Abstract › Scientific › peer-review

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ALDCoE: Finnish Centre of Excellence in Atomic Layer Deposition
Ylivaara, O. M. E. (PI), Ahopelto, J. (Participant), Puurunen, R. L. (Participant) & Grigoras, K. (Participant)
1/01/12 → 31/12/17
Project: Research Council of Finland