XRR characterization of ALD TiO2/Al2O3 nanolaminates with ultra-thin bilayers

Sakari Sintonen (Corresponding author), Saima Ali, Oili Ylivaara, Riikka L. Puurunen, Harri Lipsanen

Research output: Chapter in Book/Report/Conference proceedingConference abstract in proceedingsScientific

Abstract

Atomic layer deposited (ALD) nanolaminates have many prospective uses in mechanical, electrical and optical applications. ALD nanolaminates consist of a structure with repeated thin layers of alternating materials. A series of Al2O3/TiO2 nanolaminate samples with varied bilayer thicknesses was studied by X-Ray Reflectivity (XRR). In this study, a bilayer denotes a combination of one Al2O3 and one TiO2 layer with equal target thicknesses. The studied samples were grown with a PicosunT ALD reactor from Me3Al and H2O at 200 °C on Si substrates. Nominal bilayer thicknesses ranged from 0.1 to 50 nm and the bilayers were repeated in each sample to yield a nominal total thickness of 100 nm. It is expected that as the bilayer thickness decreases, there will be a cross-over thickness where the intended multilayer structure decomposes to a single TixAlyOz layer. XRR results show that all samples with nominal bilayer thicknesses greater or equal to 1.0 nm consisted of a repeated bilayer structure. Samples with intended bilayer thicknesses 0.5 nm or less did not show multilayer characteristics and the cross-over layer thickness is therefore in between 0.25 and 0.5 nm. XRR results further reveal precisely controlled thicknesses and sharp interfaces of individual layers. The sharpness of the multilayer peak suggests the layers maintain constant thickness and small interface roughness throughout the multilayer stack.
Original languageEnglish
Title of host publicationTechnical Program & Abstracts, published abstract of a poster
PublisherAmerican Vacuum Society AVS
Publication statusPublished - 2013
Event13th International Conference on Atomic Layer Deposition, ALD 2013 - San Diego, California, San Diego, United States
Duration: 28 Jul 201331 Jul 2013
Conference number: 13

Conference

Conference13th International Conference on Atomic Layer Deposition, ALD 2013
Abbreviated titleALD 2013
CountryUnited States
CitySan Diego
Period28/07/1331/07/13

Fingerprint

reflectance
x rays
target thickness
sharpness
laminates
roughness
reactors

Keywords

  • ALD
  • Atomic Layer Deposition
  • XRR
  • nanolaminate
  • Al2O3
  • TiO2

Cite this

Sintonen, S., Ali, S., Ylivaara, O., Puurunen, R. L., & Lipsanen, H. (2013). XRR characterization of ALD TiO2/Al2O3 nanolaminates with ultra-thin bilayers. In Technical Program & Abstracts, published abstract of a poster American Vacuum Society AVS.
Sintonen, Sakari ; Ali, Saima ; Ylivaara, Oili ; Puurunen, Riikka L. ; Lipsanen, Harri. / XRR characterization of ALD TiO2/Al2O3 nanolaminates with ultra-thin bilayers. Technical Program & Abstracts, published abstract of a poster. American Vacuum Society AVS, 2013.
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abstract = "Atomic layer deposited (ALD) nanolaminates have many prospective uses in mechanical, electrical and optical applications. ALD nanolaminates consist of a structure with repeated thin layers of alternating materials. A series of Al2O3/TiO2 nanolaminate samples with varied bilayer thicknesses was studied by X-Ray Reflectivity (XRR). In this study, a bilayer denotes a combination of one Al2O3 and one TiO2 layer with equal target thicknesses. The studied samples were grown with a PicosunT ALD reactor from Me3Al and H2O at 200 °C on Si substrates. Nominal bilayer thicknesses ranged from 0.1 to 50 nm and the bilayers were repeated in each sample to yield a nominal total thickness of 100 nm. It is expected that as the bilayer thickness decreases, there will be a cross-over thickness where the intended multilayer structure decomposes to a single TixAlyOz layer. XRR results show that all samples with nominal bilayer thicknesses greater or equal to 1.0 nm consisted of a repeated bilayer structure. Samples with intended bilayer thicknesses 0.5 nm or less did not show multilayer characteristics and the cross-over layer thickness is therefore in between 0.25 and 0.5 nm. XRR results further reveal precisely controlled thicknesses and sharp interfaces of individual layers. The sharpness of the multilayer peak suggests the layers maintain constant thickness and small interface roughness throughout the multilayer stack.",
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Sintonen, S, Ali, S, Ylivaara, O, Puurunen, RL & Lipsanen, H 2013, XRR characterization of ALD TiO2/Al2O3 nanolaminates with ultra-thin bilayers. in Technical Program & Abstracts, published abstract of a poster. American Vacuum Society AVS, 13th International Conference on Atomic Layer Deposition, ALD 2013, San Diego, United States, 28/07/13.

XRR characterization of ALD TiO2/Al2O3 nanolaminates with ultra-thin bilayers. / Sintonen, Sakari (Corresponding author); Ali, Saima; Ylivaara, Oili; Puurunen, Riikka L.; Lipsanen, Harri.

Technical Program & Abstracts, published abstract of a poster. American Vacuum Society AVS, 2013.

Research output: Chapter in Book/Report/Conference proceedingConference abstract in proceedingsScientific

TY - CHAP

T1 - XRR characterization of ALD TiO2/Al2O3 nanolaminates with ultra-thin bilayers

AU - Sintonen, Sakari

AU - Ali, Saima

AU - Ylivaara, Oili

AU - Puurunen, Riikka L.

AU - Lipsanen, Harri

N1 - CO:Aalto University CA2: TK610 SDA: MEL Project code: 74717 Project code: 73742

PY - 2013

Y1 - 2013

N2 - Atomic layer deposited (ALD) nanolaminates have many prospective uses in mechanical, electrical and optical applications. ALD nanolaminates consist of a structure with repeated thin layers of alternating materials. A series of Al2O3/TiO2 nanolaminate samples with varied bilayer thicknesses was studied by X-Ray Reflectivity (XRR). In this study, a bilayer denotes a combination of one Al2O3 and one TiO2 layer with equal target thicknesses. The studied samples were grown with a PicosunT ALD reactor from Me3Al and H2O at 200 °C on Si substrates. Nominal bilayer thicknesses ranged from 0.1 to 50 nm and the bilayers were repeated in each sample to yield a nominal total thickness of 100 nm. It is expected that as the bilayer thickness decreases, there will be a cross-over thickness where the intended multilayer structure decomposes to a single TixAlyOz layer. XRR results show that all samples with nominal bilayer thicknesses greater or equal to 1.0 nm consisted of a repeated bilayer structure. Samples with intended bilayer thicknesses 0.5 nm or less did not show multilayer characteristics and the cross-over layer thickness is therefore in between 0.25 and 0.5 nm. XRR results further reveal precisely controlled thicknesses and sharp interfaces of individual layers. The sharpness of the multilayer peak suggests the layers maintain constant thickness and small interface roughness throughout the multilayer stack.

AB - Atomic layer deposited (ALD) nanolaminates have many prospective uses in mechanical, electrical and optical applications. ALD nanolaminates consist of a structure with repeated thin layers of alternating materials. A series of Al2O3/TiO2 nanolaminate samples with varied bilayer thicknesses was studied by X-Ray Reflectivity (XRR). In this study, a bilayer denotes a combination of one Al2O3 and one TiO2 layer with equal target thicknesses. The studied samples were grown with a PicosunT ALD reactor from Me3Al and H2O at 200 °C on Si substrates. Nominal bilayer thicknesses ranged from 0.1 to 50 nm and the bilayers were repeated in each sample to yield a nominal total thickness of 100 nm. It is expected that as the bilayer thickness decreases, there will be a cross-over thickness where the intended multilayer structure decomposes to a single TixAlyOz layer. XRR results show that all samples with nominal bilayer thicknesses greater or equal to 1.0 nm consisted of a repeated bilayer structure. Samples with intended bilayer thicknesses 0.5 nm or less did not show multilayer characteristics and the cross-over layer thickness is therefore in between 0.25 and 0.5 nm. XRR results further reveal precisely controlled thicknesses and sharp interfaces of individual layers. The sharpness of the multilayer peak suggests the layers maintain constant thickness and small interface roughness throughout the multilayer stack.

KW - ALD

KW - Atomic Layer Deposition

KW - XRR

KW - nanolaminate

KW - Al2O3

KW - TiO2

M3 - Conference abstract in proceedings

BT - Technical Program & Abstracts, published abstract of a poster

PB - American Vacuum Society AVS

ER -

Sintonen S, Ali S, Ylivaara O, Puurunen RL, Lipsanen H. XRR characterization of ALD TiO2/Al2O3 nanolaminates with ultra-thin bilayers. In Technical Program & Abstracts, published abstract of a poster. American Vacuum Society AVS. 2013